Van der Waals Force Isolation of Monolayer MoS2

Alper Gurarslan, Shuping Jiao, Tai De Li, Guoqing Li, Yiling Yu, Yang Gao, Elisa Riedo, Zhiping Xu, Linyou Cao

Research output: Contribution to journalArticle

Abstract

An experiment has demonstrated that monolayer MoS2 can efficiently screen the Van der Waals (vdW) interaction of the underlying substrate with external systems by > than 90% because of the substantial increase in the physical separation between the substrate and the external systems by the presence of the monolayer. The centimeter monolayer and fewlayer MoS2 films were grown using a chemical vapor deposition process in a tube furnace. Molybdenum chloride (MoCl5) and sulfur powder were used as precursors and sapphire as growth substrates. Typical conditions for high-quality MoS2 thin film growth include a temperature of 850°C and a pressure around 2 Torr. The layer number was controlled by controlling the amount of precursors (MoCl5) used in the synthesis. The transfer of the synthesized film was performed using a surface energy- assisted transfer process. Basically, a layer of polystyrene (PS) was spin coated on as-grown MoS2 films, followed by dropping a water droplet on the top. Driven by the different surface energies of the hydrophobic MoS2 film and the hydrophilic substrate, water molecules could penetrate underneath the MoS2 film to lift the film off the growth substrate. MD simulations were carried out by using the large-scale atomic/molecular massively parallel simulator. All equilibrium simulations were performed at a constant temperature of 300 K by using the Nos?-Hoover thermostat. As monolayer MoS2 also features with excellent electrical, optical, and catalytic properties, its dominance in interfacial vdW interactions may enable capabilities to dynamically manipulate the interfacial process through electrical, optical, or chemical ways. We have observed that the contact angle of monolayer MoS2 can be tuned by applying a gating voltage.

Original languageEnglish (US)
Pages (from-to)10055-10060
Number of pages6
JournalAdvanced Materials
Volume28
Issue number45
DOIs
StatePublished - Jan 1 2016

Fingerprint

Van der Waals forces
Monolayers
Substrates
Interfacial energy
Thermostats
Water
Aluminum Oxide
Polystyrenes
Film growth
Sulfur
Sapphire
Powders
Molybdenum
Contact angle
Chemical vapor deposition
Furnaces
Simulators
Thin films
Temperature
Molecules

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Gurarslan, A., Jiao, S., Li, T. D., Li, G., Yu, Y., Gao, Y., ... Cao, L. (2016). Van der Waals Force Isolation of Monolayer MoS2 Advanced Materials, 28(45), 10055-10060. https://doi.org/10.1002/adma.201601581

Van der Waals Force Isolation of Monolayer MoS2 . / Gurarslan, Alper; Jiao, Shuping; Li, Tai De; Li, Guoqing; Yu, Yiling; Gao, Yang; Riedo, Elisa; Xu, Zhiping; Cao, Linyou.

In: Advanced Materials, Vol. 28, No. 45, 01.01.2016, p. 10055-10060.

Research output: Contribution to journalArticle

Gurarslan, A, Jiao, S, Li, TD, Li, G, Yu, Y, Gao, Y, Riedo, E, Xu, Z & Cao, L 2016, 'Van der Waals Force Isolation of Monolayer MoS2 ', Advanced Materials, vol. 28, no. 45, pp. 10055-10060. https://doi.org/10.1002/adma.201601581
Gurarslan A, Jiao S, Li TD, Li G, Yu Y, Gao Y et al. Van der Waals Force Isolation of Monolayer MoS2 Advanced Materials. 2016 Jan 1;28(45):10055-10060. https://doi.org/10.1002/adma.201601581
Gurarslan, Alper ; Jiao, Shuping ; Li, Tai De ; Li, Guoqing ; Yu, Yiling ; Gao, Yang ; Riedo, Elisa ; Xu, Zhiping ; Cao, Linyou. / Van der Waals Force Isolation of Monolayer MoS2 In: Advanced Materials. 2016 ; Vol. 28, No. 45. pp. 10055-10060.
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