V205 xerogel films as intercalation hosts for lithium: I. Insertion stoichiometry, site concentration, and specific energy

HK Park, WH Smyrl, Michael Ward

Research output: Contribution to journalArticle

Original languageEnglish (US)
Pages (from-to)1068
JournalJournal of the Electrochemical Society
Volume142
StatePublished - 1995

Cite this

@article{ce5cb5951ebf45eaab2041b0846fd7dd,
title = "V205 xerogel films as intercalation hosts for lithium: I. Insertion stoichiometry, site concentration, and specific energy",
author = "HK Park and WH Smyrl and Michael Ward",
year = "1995",
language = "English (US)",
volume = "142",
pages = "1068",
journal = "Journal of the Electrochemical Society",
issn = "0013-4651",
publisher = "Electrochemical Society, Inc.",

}

TY - JOUR

T1 - V205 xerogel films as intercalation hosts for lithium

T2 - I. Insertion stoichiometry, site concentration, and specific energy

AU - Park, HK

AU - Smyrl, WH

AU - Ward, Michael

PY - 1995

Y1 - 1995

M3 - Article

VL - 142

SP - 1068

JO - Journal of the Electrochemical Society

JF - Journal of the Electrochemical Society

SN - 0013-4651

ER -