Two-dimensional ion flux distributions in inductively coupled plasmas

Effect of adding electronegative gases to Ar

Tae Won Kim, Eray Aydil

Research output: Contribution to journalArticle

Abstract

The ion current density and corresponding uniformity in Ar/SF6 and Ar/Cl2 discharges were measured using a two-dimensional array of planar Langmuir probes which were built on a 200 mm diameter silicon wafer. Experiments were conducted in a high-density inductively coupled plasma reactor which was equipped with multiple plasma and surface diagnostics. Results indicated that the ion current density in a pure argon discharge increased with increased pressure and the discharges became more uniform as ion diffusion rate slowed down at high pressures.

Original languageEnglish (US)
Pages (from-to)6444-6450
Number of pages7
JournalJournal of Applied Physics
Volume92
Issue number11
DOIs
StatePublished - Dec 1 2002

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ion currents
gases
current density
ions
plasma diagnostics
electrostatic probes
reactors
argon
wafers
silicon

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Two-dimensional ion flux distributions in inductively coupled plasmas : Effect of adding electronegative gases to Ar. / Kim, Tae Won; Aydil, Eray.

In: Journal of Applied Physics, Vol. 92, No. 11, 01.12.2002, p. 6444-6450.

Research output: Contribution to journalArticle

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