Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 2 thin films

W. Zhu, J. Lopez, A. Belkind, K. Becker

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Time-resolved optical emission spectroscopy, anon-intrusive diagnostic method, is applied to analyze pulsed DC magnetron plasmas during the sputter deposition of TiO 2 thin films. The studies are focused on the temporal behavior of the emissions of atomic titanium, argon and oxygen in three chosen spectral regions during the "on-time" and the "reverse-time" of the plasma. Single and double exponential decays of the optical emissions are observed during the reverse period. A slow increase of the optical emissions which follow the conduction current is observed during the start of "on-time". The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode), and the O atoms (oxide mode).

Original languageEnglish (US)
Title of host publicationProceedings, Annual Technical Conference - Society of Vacuum Coaters
Pages62-67
Number of pages6
StatePublished - 2005
EventSVC, Society of Vacuum Coaters - 48th Annual Technical Conference - Denver, CO, United States
Duration: Apr 23 2005Apr 28 2005

Other

OtherSVC, Society of Vacuum Coaters - 48th Annual Technical Conference
CountryUnited States
CityDenver, CO
Period4/23/054/28/05

Fingerprint

Optical emission spectroscopy
Sputter deposition
optical emission spectroscopy
direct current
Plasmas
Thin films
Atoms
light emission
Argon
thin films
Titanium
Oxides
Oxygen
reaction time
time constant
atoms
Electrons
titanium
argon
conduction

Keywords

  • Optical emission spectroscopy
  • Pulsed plasma
  • Reactive sputtering
  • Titania

ASJC Scopus subject areas

  • Mechanical Engineering
  • Surfaces and Interfaces
  • Fluid Flow and Transfer Processes
  • Surfaces, Coatings and Films

Cite this

Zhu, W., Lopez, J., Belkind, A., & Becker, K. (2005). Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 2 thin films. In Proceedings, Annual Technical Conference - Society of Vacuum Coaters (pp. 62-67)

Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 2 thin films. / Zhu, W.; Lopez, J.; Belkind, A.; Becker, K.

Proceedings, Annual Technical Conference - Society of Vacuum Coaters. 2005. p. 62-67.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Zhu, W, Lopez, J, Belkind, A & Becker, K 2005, Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 2 thin films. in Proceedings, Annual Technical Conference - Society of Vacuum Coaters. pp. 62-67, SVC, Society of Vacuum Coaters - 48th Annual Technical Conference, Denver, CO, United States, 4/23/05.
Zhu W, Lopez J, Belkind A, Becker K. Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 2 thin films. In Proceedings, Annual Technical Conference - Society of Vacuum Coaters. 2005. p. 62-67
Zhu, W. ; Lopez, J. ; Belkind, A. ; Becker, K. / Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 2 thin films. Proceedings, Annual Technical Conference - Society of Vacuum Coaters. 2005. pp. 62-67
@inproceedings{1b06be43802543898daad5740b989286,
title = "Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 2 thin films",
abstract = "Time-resolved optical emission spectroscopy, anon-intrusive diagnostic method, is applied to analyze pulsed DC magnetron plasmas during the sputter deposition of TiO 2 thin films. The studies are focused on the temporal behavior of the emissions of atomic titanium, argon and oxygen in three chosen spectral regions during the {"}on-time{"} and the {"}reverse-time{"} of the plasma. Single and double exponential decays of the optical emissions are observed during the reverse period. A slow increase of the optical emissions which follow the conduction current is observed during the start of {"}on-time{"}. The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode), and the O atoms (oxide mode).",
keywords = "Optical emission spectroscopy, Pulsed plasma, Reactive sputtering, Titania",
author = "W. Zhu and J. Lopez and A. Belkind and K. Becker",
year = "2005",
language = "English (US)",
pages = "62--67",
booktitle = "Proceedings, Annual Technical Conference - Society of Vacuum Coaters",

}

TY - GEN

T1 - Time-resolved optical emission spectroscopy during pulsed DC magnetron sputter deposition of TiO 2 thin films

AU - Zhu, W.

AU - Lopez, J.

AU - Belkind, A.

AU - Becker, K.

PY - 2005

Y1 - 2005

N2 - Time-resolved optical emission spectroscopy, anon-intrusive diagnostic method, is applied to analyze pulsed DC magnetron plasmas during the sputter deposition of TiO 2 thin films. The studies are focused on the temporal behavior of the emissions of atomic titanium, argon and oxygen in three chosen spectral regions during the "on-time" and the "reverse-time" of the plasma. Single and double exponential decays of the optical emissions are observed during the reverse period. A slow increase of the optical emissions which follow the conduction current is observed during the start of "on-time". The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode), and the O atoms (oxide mode).

AB - Time-resolved optical emission spectroscopy, anon-intrusive diagnostic method, is applied to analyze pulsed DC magnetron plasmas during the sputter deposition of TiO 2 thin films. The studies are focused on the temporal behavior of the emissions of atomic titanium, argon and oxygen in three chosen spectral regions during the "on-time" and the "reverse-time" of the plasma. Single and double exponential decays of the optical emissions are observed during the reverse period. A slow increase of the optical emissions which follow the conduction current is observed during the start of "on-time". The various time constants can be related to the dynamics of the fast electrons, the Ar metastables, the Ti atoms (metallic mode), and the O atoms (oxide mode).

KW - Optical emission spectroscopy

KW - Pulsed plasma

KW - Reactive sputtering

KW - Titania

UR - http://www.scopus.com/inward/record.url?scp=33644993922&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33644993922&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:33644993922

SP - 62

EP - 67

BT - Proceedings, Annual Technical Conference - Society of Vacuum Coaters

ER -