Surface chemistry of Fe2O3 nanoparticles on ultrathin oxide layers on Si and Ge

K. Prabhakaran, Y. Watanabe, K. G. Nath, Y. Homma, T. Ogino, K. V P M Shafi, Abraham Ulman

Research output: Contribution to journalArticle

Abstract

In this paper, we report on a comparative study of the effect of Fe 2O3 nanoparticles (NP), introduced onto a thin oxide layer formed on silicon and germanium surfaces, on the thermal decomposition pathway of the individual oxide layers. On both the surfaces, NP of Fe 2O3 undergo a reduction reaction through a bonding partner change reaction, where the oxygen atoms change from Fe to Si or Ge. On both the surfaces, annealing results in the conversion of the suboxide-like species to dioxide-like species (SiOx to SiO2 and GeO x to GeO2 respectively for Si and Ge surfaces), until the oxide layer decomposes following the desorption of the respective monoxide species (SiO and GeO). Both the Si and Ge corelevels show a larger chemical shift (4.1 and 3.51 eV in Si 2p and Ge 3d corelevels, respectively) for the as-prepared oxide samples with the NP, at room temperature compared to that without the NP (3.7 and 3.4 eV), indicating a catalytic enhancement of the dioxide formation. Selective formation of silicon oxides leads to encapsulation of the nanoparticles and acts like a protective layer, preventing the oxidation of Fe.

Original languageEnglish (US)
Pages (from-to)191-198
Number of pages8
JournalSurface Science
Volume545
Issue number3
DOIs
StatePublished - Nov 10 2003

Fingerprint

Surface chemistry
Oxides
chemistry
Nanoparticles
nanoparticles
oxides
dioxides
Germanium
Silicon oxides
Chemical shift
Silicon
silicon oxides
Encapsulation
thermal decomposition
chemical equilibrium
oxygen atoms
germanium
Desorption
Pyrolysis
desorption

Keywords

  • Germanium
  • Iron oxide
  • Silicon
  • Silicon oxides
  • Surface chemical reaction
  • X-ray photoelectron spectroscopy

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Prabhakaran, K., Watanabe, Y., Nath, K. G., Homma, Y., Ogino, T., Shafi, K. V. P. M., & Ulman, A. (2003). Surface chemistry of Fe2O3 nanoparticles on ultrathin oxide layers on Si and Ge. Surface Science, 545(3), 191-198. https://doi.org/10.1016/j.susc.2003.08.049

Surface chemistry of Fe2O3 nanoparticles on ultrathin oxide layers on Si and Ge. / Prabhakaran, K.; Watanabe, Y.; Nath, K. G.; Homma, Y.; Ogino, T.; Shafi, K. V P M; Ulman, Abraham.

In: Surface Science, Vol. 545, No. 3, 10.11.2003, p. 191-198.

Research output: Contribution to journalArticle

Prabhakaran, K, Watanabe, Y, Nath, KG, Homma, Y, Ogino, T, Shafi, KVPM & Ulman, A 2003, 'Surface chemistry of Fe2O3 nanoparticles on ultrathin oxide layers on Si and Ge', Surface Science, vol. 545, no. 3, pp. 191-198. https://doi.org/10.1016/j.susc.2003.08.049
Prabhakaran K, Watanabe Y, Nath KG, Homma Y, Ogino T, Shafi KVPM et al. Surface chemistry of Fe2O3 nanoparticles on ultrathin oxide layers on Si and Ge. Surface Science. 2003 Nov 10;545(3):191-198. https://doi.org/10.1016/j.susc.2003.08.049
Prabhakaran, K. ; Watanabe, Y. ; Nath, K. G. ; Homma, Y. ; Ogino, T. ; Shafi, K. V P M ; Ulman, Abraham. / Surface chemistry of Fe2O3 nanoparticles on ultrathin oxide layers on Si and Ge. In: Surface Science. 2003 ; Vol. 545, No. 3. pp. 191-198.
@article{965c8714547646f7939a9755b86d5c50,
title = "Surface chemistry of Fe2O3 nanoparticles on ultrathin oxide layers on Si and Ge",
abstract = "In this paper, we report on a comparative study of the effect of Fe 2O3 nanoparticles (NP), introduced onto a thin oxide layer formed on silicon and germanium surfaces, on the thermal decomposition pathway of the individual oxide layers. On both the surfaces, NP of Fe 2O3 undergo a reduction reaction through a bonding partner change reaction, where the oxygen atoms change from Fe to Si or Ge. On both the surfaces, annealing results in the conversion of the suboxide-like species to dioxide-like species (SiOx to SiO2 and GeO x to GeO2 respectively for Si and Ge surfaces), until the oxide layer decomposes following the desorption of the respective monoxide species (SiO and GeO). Both the Si and Ge corelevels show a larger chemical shift (4.1 and 3.51 eV in Si 2p and Ge 3d corelevels, respectively) for the as-prepared oxide samples with the NP, at room temperature compared to that without the NP (3.7 and 3.4 eV), indicating a catalytic enhancement of the dioxide formation. Selective formation of silicon oxides leads to encapsulation of the nanoparticles and acts like a protective layer, preventing the oxidation of Fe.",
keywords = "Germanium, Iron oxide, Silicon, Silicon oxides, Surface chemical reaction, X-ray photoelectron spectroscopy",
author = "K. Prabhakaran and Y. Watanabe and Nath, {K. G.} and Y. Homma and T. Ogino and Shafi, {K. V P M} and Abraham Ulman",
year = "2003",
month = "11",
day = "10",
doi = "10.1016/j.susc.2003.08.049",
language = "English (US)",
volume = "545",
pages = "191--198",
journal = "Surface Science",
issn = "0039-6028",
publisher = "Elsevier",
number = "3",

}

TY - JOUR

T1 - Surface chemistry of Fe2O3 nanoparticles on ultrathin oxide layers on Si and Ge

AU - Prabhakaran, K.

AU - Watanabe, Y.

AU - Nath, K. G.

AU - Homma, Y.

AU - Ogino, T.

AU - Shafi, K. V P M

AU - Ulman, Abraham

PY - 2003/11/10

Y1 - 2003/11/10

N2 - In this paper, we report on a comparative study of the effect of Fe 2O3 nanoparticles (NP), introduced onto a thin oxide layer formed on silicon and germanium surfaces, on the thermal decomposition pathway of the individual oxide layers. On both the surfaces, NP of Fe 2O3 undergo a reduction reaction through a bonding partner change reaction, where the oxygen atoms change from Fe to Si or Ge. On both the surfaces, annealing results in the conversion of the suboxide-like species to dioxide-like species (SiOx to SiO2 and GeO x to GeO2 respectively for Si and Ge surfaces), until the oxide layer decomposes following the desorption of the respective monoxide species (SiO and GeO). Both the Si and Ge corelevels show a larger chemical shift (4.1 and 3.51 eV in Si 2p and Ge 3d corelevels, respectively) for the as-prepared oxide samples with the NP, at room temperature compared to that without the NP (3.7 and 3.4 eV), indicating a catalytic enhancement of the dioxide formation. Selective formation of silicon oxides leads to encapsulation of the nanoparticles and acts like a protective layer, preventing the oxidation of Fe.

AB - In this paper, we report on a comparative study of the effect of Fe 2O3 nanoparticles (NP), introduced onto a thin oxide layer formed on silicon and germanium surfaces, on the thermal decomposition pathway of the individual oxide layers. On both the surfaces, NP of Fe 2O3 undergo a reduction reaction through a bonding partner change reaction, where the oxygen atoms change from Fe to Si or Ge. On both the surfaces, annealing results in the conversion of the suboxide-like species to dioxide-like species (SiOx to SiO2 and GeO x to GeO2 respectively for Si and Ge surfaces), until the oxide layer decomposes following the desorption of the respective monoxide species (SiO and GeO). Both the Si and Ge corelevels show a larger chemical shift (4.1 and 3.51 eV in Si 2p and Ge 3d corelevels, respectively) for the as-prepared oxide samples with the NP, at room temperature compared to that without the NP (3.7 and 3.4 eV), indicating a catalytic enhancement of the dioxide formation. Selective formation of silicon oxides leads to encapsulation of the nanoparticles and acts like a protective layer, preventing the oxidation of Fe.

KW - Germanium

KW - Iron oxide

KW - Silicon

KW - Silicon oxides

KW - Surface chemical reaction

KW - X-ray photoelectron spectroscopy

UR - http://www.scopus.com/inward/record.url?scp=0142030551&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0142030551&partnerID=8YFLogxK

U2 - 10.1016/j.susc.2003.08.049

DO - 10.1016/j.susc.2003.08.049

M3 - Article

VL - 545

SP - 191

EP - 198

JO - Surface Science

JF - Surface Science

SN - 0039-6028

IS - 3

ER -