Abstract
The dense radial structure is a distinct morphology which develops in many diffusive pattern-forming systems. We propose the first model to explain the stability of this structure. Stability arises in this model from the resistivity of the growth channels, which has been neglected in previous analyses. We also report excellent agreement between the predictions of our model and experimental results from two-dimensional electrochemical deposition.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2315-2318 |
| Number of pages | 4 |
| Journal | Physical Review Letters |
| Volume | 59 |
| Issue number | 20 |
| DOIs | |
| State | Published - 1987 |
Fingerprint
ASJC Scopus subject areas
- Physics and Astronomy(all)
Cite this
Stability of the dense radial morphology in diffusive pattern formation. / Grier, David G.; Kessler, David A.; Sander, L. M.
In: Physical Review Letters, Vol. 59, No. 20, 1987, p. 2315-2318.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Stability of the dense radial morphology in diffusive pattern formation
AU - Grier, David G.
AU - Kessler, David A.
AU - Sander, L. M.
PY - 1987
Y1 - 1987
N2 - The dense radial structure is a distinct morphology which develops in many diffusive pattern-forming systems. We propose the first model to explain the stability of this structure. Stability arises in this model from the resistivity of the growth channels, which has been neglected in previous analyses. We also report excellent agreement between the predictions of our model and experimental results from two-dimensional electrochemical deposition.
AB - The dense radial structure is a distinct morphology which develops in many diffusive pattern-forming systems. We propose the first model to explain the stability of this structure. Stability arises in this model from the resistivity of the growth channels, which has been neglected in previous analyses. We also report excellent agreement between the predictions of our model and experimental results from two-dimensional electrochemical deposition.
UR - http://www.scopus.com/inward/record.url?scp=4043122620&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=4043122620&partnerID=8YFLogxK
U2 - 10.1103/PhysRevLett.59.2315
DO - 10.1103/PhysRevLett.59.2315
M3 - Article
AN - SCOPUS:4043122620
VL - 59
SP - 2315
EP - 2318
JO - Physical Review Letters
JF - Physical Review Letters
SN - 0031-9007
IS - 20
ER -