Spatially resolved endpoint detector for plasma etcher

Roawen Chen, Sundeep Rangan, Costas J. Spanos

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this paper we present a novel spatially resolved sensor to detect the endpoint and monitor spatial uniformity for a plasma etching process. A scanning spatially-resolved optical emission spectroscopy (SROES) system was built and installed in Berkeley's Microfabrication Laboratory. This sensor system consists of a stepper motor, controller, and a monochrometer, which provides an in-situ real-time monitoring of the etching endpoint spatially. In this paper, we show the promise of this spatially-resolved endpoint detector, and explain our hardware design and the future experiment plan.

Original languageEnglish (US)
Title of host publicationIEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings
Editors Anon
PublisherIEEE
StatePublished - 1997
EventProceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference - San Francisco, CA, USA
Duration: Oct 6 1997Oct 8 1997

Other

OtherProceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference
CitySan Francisco, CA, USA
Period10/6/9710/8/97

Fingerprint

Detectors
Plasmas
Optical emission spectroscopy
Plasma etching
Microfabrication
Sensors
Etching
Scanning
Hardware
Controllers
Monitoring
Experiments

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering

Cite this

Chen, R., Rangan, S., & Spanos, C. J. (1997). Spatially resolved endpoint detector for plasma etcher. In Anon (Ed.), IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings IEEE.

Spatially resolved endpoint detector for plasma etcher. / Chen, Roawen; Rangan, Sundeep; Spanos, Costas J.

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings. ed. / Anon. IEEE, 1997.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Chen, R, Rangan, S & Spanos, CJ 1997, Spatially resolved endpoint detector for plasma etcher. in Anon (ed.), IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings. IEEE, Proceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference, San Francisco, CA, USA, 10/6/97.
Chen R, Rangan S, Spanos CJ. Spatially resolved endpoint detector for plasma etcher. In Anon, editor, IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings. IEEE. 1997
Chen, Roawen ; Rangan, Sundeep ; Spanos, Costas J. / Spatially resolved endpoint detector for plasma etcher. IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings. editor / Anon. IEEE, 1997.
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