Silicon nanowire polarizers for far ultraviolet (sub-200 nm) applications: Modeling and fabrication

John M. Papalia, Douglas H. Adamson, Paul M. Chaikin, Richard A. Register

    Research output: Contribution to journalArticle

    Abstract

    We have previously demonstrated a fabrication technique for the creation of silicon wire grid polarizers (WGPs) for far (deep) ultraviolet applications utilizing a shear-aligned cylinder-forming polystyrene- b -poly(n -hexyl methacrylate) diblock copolymer as a mask for reactive ion etching of an amorphous silicon substrate. In our current work, a numerical model is refined and applied to our experimental systems to describe the impact of wire height and periodicity, and tradeoffs between the two, on polarization efficiency. We focus our attention at a wavelength of 193 nm, the emission wavelength of the ArF excimer laser currently in use in advanced photolithographic processes. Through application of the model's predictions we have achieved marked improvement in the polarization efficiency of our WGPs by increasing the block copolymer molecular weight, thereby increasing the thickness of the Si wires, which compensates for a simultaneous increase in wire periodicity; the resulting arrays of parallel Si nanowires exhibit polarization efficiencies approaching 64% at 193 nm, a 68% relative increase over our previous Si WGPs.

    Original languageEnglish (US)
    Article number084305
    JournalJournal of Applied Physics
    Volume107
    Issue number8
    DOIs
    StatePublished - Apr 15 2010

    Fingerprint

    polarizers
    nanowires
    wire
    fabrication
    silicon
    grids
    periodic variations
    polarization
    tradeoffs
    block copolymers
    wavelengths
    excimer lasers
    amorphous silicon
    molecular weight
    polystyrene
    copolymers
    masks
    etching
    shear
    predictions

    ASJC Scopus subject areas

    • Physics and Astronomy(all)

    Cite this

    Silicon nanowire polarizers for far ultraviolet (sub-200 nm) applications : Modeling and fabrication. / Papalia, John M.; Adamson, Douglas H.; Chaikin, Paul M.; Register, Richard A.

    In: Journal of Applied Physics, Vol. 107, No. 8, 084305, 15.04.2010.

    Research output: Contribution to journalArticle

    Papalia, John M. ; Adamson, Douglas H. ; Chaikin, Paul M. ; Register, Richard A. / Silicon nanowire polarizers for far ultraviolet (sub-200 nm) applications : Modeling and fabrication. In: Journal of Applied Physics. 2010 ; Vol. 107, No. 8.
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