Silicon nanowire grid polarizer for very deep ultraviolet fabricated from a shear-aligned diblock copolymer template

Young Rae Hong, Koji Asakawa, Douglas H. Adamson, Paul M. Chaikin, Richard A. Register

    Research output: Contribution to journalArticle

    Abstract

    A silicon (Si) nanowire grid ultraviolet (UV) transmission polarizer has been fabricated, and its performance was measured over the visible to deep UV range. A cylinder-forming polystyrene-b-poly(hexylmethacrylate) diblock copolymer was coated onto an amorphous Si layer supported on a fused silica substrate, then shear aligned and employed as a mask for reactive-ion etching, resulting in a Si grid of 33 nm period and multi-centimeter-squared area. Due to the high plasma frequency and UV reflectance of the deposited Si, this nanowire grid was able to polarize light down into the deep UV, including 193 nm.

    Original languageEnglish (US)
    Pages (from-to)3125-3127
    Number of pages3
    JournalOptics Letters
    Volume32
    Issue number21
    DOIs
    StatePublished - Nov 1 2007

    Fingerprint

    polarizers
    copolymers
    nanowires
    templates
    grids
    shear
    silicon
    plasma frequencies
    amorphous silicon
    polystyrene
    masks
    etching
    silicon dioxide
    reflectance
    ions

    ASJC Scopus subject areas

    • Atomic and Molecular Physics, and Optics

    Cite this

    Silicon nanowire grid polarizer for very deep ultraviolet fabricated from a shear-aligned diblock copolymer template. / Hong, Young Rae; Asakawa, Koji; Adamson, Douglas H.; Chaikin, Paul M.; Register, Richard A.

    In: Optics Letters, Vol. 32, No. 21, 01.11.2007, p. 3125-3127.

    Research output: Contribution to journalArticle

    Hong, Young Rae ; Asakawa, Koji ; Adamson, Douglas H. ; Chaikin, Paul M. ; Register, Richard A. / Silicon nanowire grid polarizer for very deep ultraviolet fabricated from a shear-aligned diblock copolymer template. In: Optics Letters. 2007 ; Vol. 32, No. 21. pp. 3125-3127.
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