Silicon hydride composition of plasma-deposited hydrogenated amorphous and nanocrystalline silicon films and surfaces

Denise C. Marra, Erik A. Edelberg, Ryan L. Naone, Eray Aydil

Research output: Contribution to journalArticle

Abstract

In situ attenuated total reflection Fourier transform infrared spectroscopy was used to study the H bonding on the surfaces of a-Si:H and nc-Si:H during plasma enhanced chemical vapor deposition from SiH4/H2/Ar containing discharges. Well-resolved SiHx (1≤x≤3) absorption lines that correspond to the vibrational frequencies commonly associated with surface silicon hydrides were detected. During deposition of a-Si:H films using SiH4 without H2 dilution, the surface coverage was primarily di- and trihydrides, and there are very few dangling bonds on the surface. In contrast, during deposition of nc-Si:H using SiH4 diluted with H2, the amount of di- and trihydrides on the surface is drastically reduced and monohydrides dominate the surface. Furthermore, the vibrational frequencies of the monohydrides on nc-Si:H film surfaces match well with the resonant frequencies of monohydrides on H terminated Si (111) and Si (100) surfaces. The decrease of higher hydrides on the surface upon H2 dilution is attributed to increased dissociation rate of tri- and dihydrides on the surface through reaction with dangling bonds created by increased rate of H abstraction from the surface. Results presented are consistent with SiH3 being at least one of the precursors of a-Si:H deposition.

Original languageEnglish (US)
Pages (from-to)3199-3210
Number of pages12
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume16
Issue number6
DOIs
StatePublished - Jan 1 1998

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Nanocrystalline silicon
silicon films
Amorphous silicon
Silanes
hydrides
amorphous silicon
Plasmas
silicon
Chemical analysis
dihydrides
Dangling bonds
Vibrational spectra
dilution
Dilution
Plasma enhanced chemical vapor deposition
surface reactions
Hydrides
resonant frequencies
Fourier transform infrared spectroscopy
Natural frequencies

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Silicon hydride composition of plasma-deposited hydrogenated amorphous and nanocrystalline silicon films and surfaces. / Marra, Denise C.; Edelberg, Erik A.; Naone, Ryan L.; Aydil, Eray.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 16, No. 6, 01.01.1998, p. 3199-3210.

Research output: Contribution to journalArticle

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