Self-assembled monolayer growth of octadecylphosphonic acid on mica

John T. Woodward, Abraham Ulman, Daniel K. Schwartz

Research output: Contribution to journalArticle

Abstract

Self-assembled monolayers are formed by exposing freshly cleaved mica to a solution of octadecylphosphonic acid in tetrahydrofuran. Atomic force microscope images of samples immersed in solution for varying exposure times show that prior to forming a complete monolayer the molecules aggregate into dense islands (1.8 ± 0.2 nm high) on the surface. The islands have a compact, rounded morphology. The cosine of the contact angle between hexadecane and the partial monolayers has an approximately linear dependence on coverage. However, the cosine of the contact angle of water decreases linearly to about 50% coverage (the percolation threshold of the phosphonate islands) and then appears to saturate.

Original languageEnglish (US)
Pages (from-to)3626-3629
Number of pages4
JournalLangmuir
Volume12
Issue number15
StatePublished - Jul 24 1996

Fingerprint

Mica
Self assembled monolayers
mica
Contact angle
Monolayers
Organophosphonates
acids
Acids
Microscopes
tetrahydrofuran
Molecules
Water
microscopes
thresholds
water
molecules
n-hexadecane

ASJC Scopus subject areas

  • Colloid and Surface Chemistry
  • Physical and Theoretical Chemistry

Cite this

Woodward, J. T., Ulman, A., & Schwartz, D. K. (1996). Self-assembled monolayer growth of octadecylphosphonic acid on mica. Langmuir, 12(15), 3626-3629.

Self-assembled monolayer growth of octadecylphosphonic acid on mica. / Woodward, John T.; Ulman, Abraham; Schwartz, Daniel K.

In: Langmuir, Vol. 12, No. 15, 24.07.1996, p. 3626-3629.

Research output: Contribution to journalArticle

Woodward, JT, Ulman, A & Schwartz, DK 1996, 'Self-assembled monolayer growth of octadecylphosphonic acid on mica', Langmuir, vol. 12, no. 15, pp. 3626-3629.
Woodward JT, Ulman A, Schwartz DK. Self-assembled monolayer growth of octadecylphosphonic acid on mica. Langmuir. 1996 Jul 24;12(15):3626-3629.
Woodward, John T. ; Ulman, Abraham ; Schwartz, Daniel K. / Self-assembled monolayer growth of octadecylphosphonic acid on mica. In: Langmuir. 1996 ; Vol. 12, No. 15. pp. 3626-3629.
@article{02aeb4caf2a046c29aa5428e4c324942,
title = "Self-assembled monolayer growth of octadecylphosphonic acid on mica",
abstract = "Self-assembled monolayers are formed by exposing freshly cleaved mica to a solution of octadecylphosphonic acid in tetrahydrofuran. Atomic force microscope images of samples immersed in solution for varying exposure times show that prior to forming a complete monolayer the molecules aggregate into dense islands (1.8 ± 0.2 nm high) on the surface. The islands have a compact, rounded morphology. The cosine of the contact angle between hexadecane and the partial monolayers has an approximately linear dependence on coverage. However, the cosine of the contact angle of water decreases linearly to about 50{\%} coverage (the percolation threshold of the phosphonate islands) and then appears to saturate.",
author = "Woodward, {John T.} and Abraham Ulman and Schwartz, {Daniel K.}",
year = "1996",
month = "7",
day = "24",
language = "English (US)",
volume = "12",
pages = "3626--3629",
journal = "Langmuir",
issn = "0743-7463",
publisher = "American Chemical Society",
number = "15",

}

TY - JOUR

T1 - Self-assembled monolayer growth of octadecylphosphonic acid on mica

AU - Woodward, John T.

AU - Ulman, Abraham

AU - Schwartz, Daniel K.

PY - 1996/7/24

Y1 - 1996/7/24

N2 - Self-assembled monolayers are formed by exposing freshly cleaved mica to a solution of octadecylphosphonic acid in tetrahydrofuran. Atomic force microscope images of samples immersed in solution for varying exposure times show that prior to forming a complete monolayer the molecules aggregate into dense islands (1.8 ± 0.2 nm high) on the surface. The islands have a compact, rounded morphology. The cosine of the contact angle between hexadecane and the partial monolayers has an approximately linear dependence on coverage. However, the cosine of the contact angle of water decreases linearly to about 50% coverage (the percolation threshold of the phosphonate islands) and then appears to saturate.

AB - Self-assembled monolayers are formed by exposing freshly cleaved mica to a solution of octadecylphosphonic acid in tetrahydrofuran. Atomic force microscope images of samples immersed in solution for varying exposure times show that prior to forming a complete monolayer the molecules aggregate into dense islands (1.8 ± 0.2 nm high) on the surface. The islands have a compact, rounded morphology. The cosine of the contact angle between hexadecane and the partial monolayers has an approximately linear dependence on coverage. However, the cosine of the contact angle of water decreases linearly to about 50% coverage (the percolation threshold of the phosphonate islands) and then appears to saturate.

UR - http://www.scopus.com/inward/record.url?scp=0030198024&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0030198024&partnerID=8YFLogxK

M3 - Article

VL - 12

SP - 3626

EP - 3629

JO - Langmuir

JF - Langmuir

SN - 0743-7463

IS - 15

ER -