Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma

Vishwas S. Purohit, A. B. Bhise, Shirshendu Dey, M. A. More, C. V. Dharmadhikari, D. S. Joag, Renu Pasricha, S. V. Bhoraskar

Research output: Contribution to journalArticle

Abstract

Cathodic sputtering is demonstrated to be effective in synthesizing thin films of molybdenum nanoparticles. An electron cyclotron resonance plasma reactor has been used as the source. The particle size distribution is found to be controllable by proper choice of the cathodic bias potential. Sizes ranging between 20 and 30 nm deposited at the optimum bias potential are found to exhibit a self assembled structure as observed by scanning tunneling microscopy. Field emission microscopic studies on these films supported on W have exhibited very stable emission current over a period of 3 h.

Original languageEnglish (US)
Pages (from-to)435-443
Number of pages9
JournalVacuum
Volume83
Issue number2
DOIs
StatePublished - Sep 26 2008

Fingerprint

Electron cyclotron resonance
Molybdenum
Scanning tunneling microscopy
electron cyclotron resonance
Particle size analysis
Field emission
molybdenum
Sputtering
field emission
Nanoparticles
Scanning
Plasmas
Thin films
scanning
particle size distribution
scanning tunneling microscopy
sputtering
reactors
nanoparticles
thin films

Keywords

  • ECR plasma
  • Field emission microscopy
  • Hollow cathode chemical sputtering
  • Mo nanoparticles
  • Scanning tunneling microscopy

ASJC Scopus subject areas

  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films

Cite this

Purohit, V. S., Bhise, A. B., Dey, S., More, M. A., Dharmadhikari, C. V., Joag, D. S., ... Bhoraskar, S. V. (2008). Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma. Vacuum, 83(2), 435-443. https://doi.org/10.1016/j.vacuum.2008.04.077

Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma. / Purohit, Vishwas S.; Bhise, A. B.; Dey, Shirshendu; More, M. A.; Dharmadhikari, C. V.; Joag, D. S.; Pasricha, Renu; Bhoraskar, S. V.

In: Vacuum, Vol. 83, No. 2, 26.09.2008, p. 435-443.

Research output: Contribution to journalArticle

Purohit, Vishwas S. ; Bhise, A. B. ; Dey, Shirshendu ; More, M. A. ; Dharmadhikari, C. V. ; Joag, D. S. ; Pasricha, Renu ; Bhoraskar, S. V. / Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma. In: Vacuum. 2008 ; Vol. 83, No. 2. pp. 435-443.
@article{29f3a1a9bd00448cb332bb69ce557cf8,
title = "Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma",
abstract = "Cathodic sputtering is demonstrated to be effective in synthesizing thin films of molybdenum nanoparticles. An electron cyclotron resonance plasma reactor has been used as the source. The particle size distribution is found to be controllable by proper choice of the cathodic bias potential. Sizes ranging between 20 and 30 nm deposited at the optimum bias potential are found to exhibit a self assembled structure as observed by scanning tunneling microscopy. Field emission microscopic studies on these films supported on W have exhibited very stable emission current over a period of 3 h.",
keywords = "ECR plasma, Field emission microscopy, Hollow cathode chemical sputtering, Mo nanoparticles, Scanning tunneling microscopy",
author = "Purohit, {Vishwas S.} and Bhise, {A. B.} and Shirshendu Dey and More, {M. A.} and Dharmadhikari, {C. V.} and Joag, {D. S.} and Renu Pasricha and Bhoraskar, {S. V.}",
year = "2008",
month = "9",
day = "26",
doi = "10.1016/j.vacuum.2008.04.077",
language = "English (US)",
volume = "83",
pages = "435--443",
journal = "Vacuum",
issn = "0042-207X",
publisher = "Elsevier Limited",
number = "2",

}

TY - JOUR

T1 - Scanning tunneling microscopic and field emission microscopic studies of nanostructured molybdenum film synthesized by electron cyclotron resonance plasma

AU - Purohit, Vishwas S.

AU - Bhise, A. B.

AU - Dey, Shirshendu

AU - More, M. A.

AU - Dharmadhikari, C. V.

AU - Joag, D. S.

AU - Pasricha, Renu

AU - Bhoraskar, S. V.

PY - 2008/9/26

Y1 - 2008/9/26

N2 - Cathodic sputtering is demonstrated to be effective in synthesizing thin films of molybdenum nanoparticles. An electron cyclotron resonance plasma reactor has been used as the source. The particle size distribution is found to be controllable by proper choice of the cathodic bias potential. Sizes ranging between 20 and 30 nm deposited at the optimum bias potential are found to exhibit a self assembled structure as observed by scanning tunneling microscopy. Field emission microscopic studies on these films supported on W have exhibited very stable emission current over a period of 3 h.

AB - Cathodic sputtering is demonstrated to be effective in synthesizing thin films of molybdenum nanoparticles. An electron cyclotron resonance plasma reactor has been used as the source. The particle size distribution is found to be controllable by proper choice of the cathodic bias potential. Sizes ranging between 20 and 30 nm deposited at the optimum bias potential are found to exhibit a self assembled structure as observed by scanning tunneling microscopy. Field emission microscopic studies on these films supported on W have exhibited very stable emission current over a period of 3 h.

KW - ECR plasma

KW - Field emission microscopy

KW - Hollow cathode chemical sputtering

KW - Mo nanoparticles

KW - Scanning tunneling microscopy

UR - http://www.scopus.com/inward/record.url?scp=51249105330&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=51249105330&partnerID=8YFLogxK

U2 - 10.1016/j.vacuum.2008.04.077

DO - 10.1016/j.vacuum.2008.04.077

M3 - Article

AN - SCOPUS:51249105330

VL - 83

SP - 435

EP - 443

JO - Vacuum

JF - Vacuum

SN - 0042-207X

IS - 2

ER -