Reversible nanoscale local wettability modifications by thermochemical nanolithography

Debin Wang, Takashi Okada, Robert Szoszkiewicz, Simon C. Jones, Marcel Lucas, Jungchul Lee, William P. King, Seth R. Marder, Elisa Riedo

Research output: Contribution to journalConference article

Abstract

Recently, the development of a versatile thermochemical nanolithography (TCNL) technique was reported. It allows for simultaneous control of the local chemistry and topography of thin polymer films. This technique can pattern sub-15 nm chemical and topographical features at the rate of 1.4 mm per second by inducing thermally-activated chemical reactions by means of a heated atomic force microscope (AFM) tip. TCNL is achievable in different environments and can easily be adapted to a variety of substrates and chemical functionalities. Here, we demonstrate that a thin polymer film can be chemically modified twice using TCNL to tune its wettability. We are able to write hydrophilic nanopatterns over a hydrophobic polymer surface in a first heating step and then revert back to a hydrophobic nanopattern in a second heating step. This capability is particularly useful in data storage application and complex nanofluidic device design.

Original languageEnglish (US)
Pages (from-to)37-42
Number of pages6
JournalMaterials Research Society Symposium Proceedings
Volume1059
StatePublished - Dec 1 2008
EventNanoscale Pattern Formation - Boston, MA, United States
Duration: Nov 26 2007Nov 30 2007

Fingerprint

Nanolithography
wettability
Wetting
Polymer films
polymers
Nanofluidics
Heating
Thin films
heating
data storage
Topography
Chemical reactions
chemical reactions
topography
Polymers
Microscopes
microscopes
chemistry
Data storage equipment
Substrates

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

Cite this

Reversible nanoscale local wettability modifications by thermochemical nanolithography. / Wang, Debin; Okada, Takashi; Szoszkiewicz, Robert; Jones, Simon C.; Lucas, Marcel; Lee, Jungchul; King, William P.; Marder, Seth R.; Riedo, Elisa.

In: Materials Research Society Symposium Proceedings, Vol. 1059, 01.12.2008, p. 37-42.

Research output: Contribution to journalConference article

Wang, D, Okada, T, Szoszkiewicz, R, Jones, SC, Lucas, M, Lee, J, King, WP, Marder, SR & Riedo, E 2008, 'Reversible nanoscale local wettability modifications by thermochemical nanolithography', Materials Research Society Symposium Proceedings, vol. 1059, pp. 37-42.
Wang D, Okada T, Szoszkiewicz R, Jones SC, Lucas M, Lee J et al. Reversible nanoscale local wettability modifications by thermochemical nanolithography. Materials Research Society Symposium Proceedings. 2008 Dec 1;1059:37-42.
Wang, Debin ; Okada, Takashi ; Szoszkiewicz, Robert ; Jones, Simon C. ; Lucas, Marcel ; Lee, Jungchul ; King, William P. ; Marder, Seth R. ; Riedo, Elisa. / Reversible nanoscale local wettability modifications by thermochemical nanolithography. In: Materials Research Society Symposium Proceedings. 2008 ; Vol. 1059. pp. 37-42.
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