Reliability-based optimisation of chemical vapour deposition process

Pradeep George, Po Ting Lin, Hae Chang Gea, Yogesh Jaluria

    Research output: Contribution to journalArticle

    Abstract

    In this paper, the process of Chemical Vapour Deposition (CVD) in a vertical impinging reactor is simulated and optimised using the reliability-based performance measure approach for the deposition of a thin film of silicon from silane. The key focus is on the rate of deposition and on the quality of the thin film produced. Proper control of the governing transport processes results in large area film thickness and composition uniformity. The effect of important design parameters and operating conditions are studied using numerical simulations. Response surfaces are generated for deposition rate and uniformity of the deposited film using compromise response surface method for the range of design variables considered. The resulting response surfaces are used to optimise the CVD system by considering the uncertainty in the design variables.

    Original languageEnglish (US)
    Pages (from-to)363-383
    Number of pages21
    JournalInternational Journal of Reliability and Safety
    Volume3
    Issue number4
    DOIs
    StatePublished - Oct 9 2009

    Fingerprint

    Chemical vapor deposition
    Thin films
    Deposition rates
    Silanes
    Film thickness
    Silicon
    Computer simulation
    Chemical analysis
    Uncertainty

    Keywords

    • Chemical vapour deposition
    • Compromise response surface method
    • CRSM
    • CVD
    • Performance measure approach
    • PMA
    • RBDO
    • Reliability-based design optimisation
    • Silane
    • Silicon
    • Vertical impinging reactor

    ASJC Scopus subject areas

    • Safety, Risk, Reliability and Quality

    Cite this

    Reliability-based optimisation of chemical vapour deposition process. / George, Pradeep; Lin, Po Ting; Gea, Hae Chang; Jaluria, Yogesh.

    In: International Journal of Reliability and Safety, Vol. 3, No. 4, 09.10.2009, p. 363-383.

    Research output: Contribution to journalArticle

    George, Pradeep ; Lin, Po Ting ; Gea, Hae Chang ; Jaluria, Yogesh. / Reliability-based optimisation of chemical vapour deposition process. In: International Journal of Reliability and Safety. 2009 ; Vol. 3, No. 4. pp. 363-383.
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