Real-time monitoring of surface chemistry during plasma processing

Eray Aydil, R. A. Gottscho, Y. J. Chabal

Research output: Contribution to journalArticle

Abstract

Techniques available for real time, in situ monitoring of surface chemistry during plasma processing are reviewed. Emphasis is given to recent uses of attenuated-total-reflection Fourier transform infrared (ATR-FTIR) spectroscopy to study surface bond vibrations during plasma cleaning and passivation of Si and GaAs surfaces. Examples are chosen to demonstrate the utility of real-time monitoring of surfaces for developing and optimizing plasma processes used in manufacturing of electronic and optoelectronic devices.

Original languageEnglish (US)
Pages (from-to)1381-1388
Number of pages8
JournalPure and Applied Chemistry
Volume66
Issue number6
DOIs
StatePublished - Jan 1 1994

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Plasma applications
Surface chemistry
Monitoring
Plasmas
Passivation
Optoelectronic devices
Fourier transform infrared spectroscopy
Cleaning

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

Cite this

Real-time monitoring of surface chemistry during plasma processing. / Aydil, Eray; Gottscho, R. A.; Chabal, Y. J.

In: Pure and Applied Chemistry, Vol. 66, No. 6, 01.01.1994, p. 1381-1388.

Research output: Contribution to journalArticle

Aydil, Eray ; Gottscho, R. A. ; Chabal, Y. J. / Real-time monitoring of surface chemistry during plasma processing. In: Pure and Applied Chemistry. 1994 ; Vol. 66, No. 6. pp. 1381-1388.
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