Reactive magnetron sputtering of thin-film superconductor YBa 2Cu3O7-x

K. Char, A. D. Kent, A. Kapitulnik, M. R. Beasley, T. H. Geballe

    Research output: Contribution to journalArticle

    Abstract

    Superconducting thin films of YBa2Cu3O7-x have been successfully made by co-sputtering from the three targets in an Ar and O2 mixture atmosphere. After high-temperature anneal films are superconducting with an onset temperature at 90 K, a full transition temperature as high as 88 K, and a critical current density in excess of 1×10 5 A/cm2 at 78 K and 2×106 A/cm 2 at 4.2 K. Highly oriented thin films have been obtained on SrTiO3 {100} substrates.

    Original languageEnglish (US)
    Pages (from-to)1370-1372
    Number of pages3
    JournalApplied Physics Letters
    Volume51
    Issue number17
    DOIs
    StatePublished - 1987

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    magnetron sputtering
    superconducting films
    thin films
    critical current
    sputtering
    transition temperature
    current density
    atmospheres
    temperature

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

    Cite this

    Char, K., Kent, A. D., Kapitulnik, A., Beasley, M. R., & Geballe, T. H. (1987). Reactive magnetron sputtering of thin-film superconductor YBa 2Cu3O7-x . Applied Physics Letters, 51(17), 1370-1372. https://doi.org/10.1063/1.98682

    Reactive magnetron sputtering of thin-film superconductor YBa 2Cu3O7-x . / Char, K.; Kent, A. D.; Kapitulnik, A.; Beasley, M. R.; Geballe, T. H.

    In: Applied Physics Letters, Vol. 51, No. 17, 1987, p. 1370-1372.

    Research output: Contribution to journalArticle

    Char, K, Kent, AD, Kapitulnik, A, Beasley, MR & Geballe, TH 1987, 'Reactive magnetron sputtering of thin-film superconductor YBa 2Cu3O7-x ', Applied Physics Letters, vol. 51, no. 17, pp. 1370-1372. https://doi.org/10.1063/1.98682
    Char, K. ; Kent, A. D. ; Kapitulnik, A. ; Beasley, M. R. ; Geballe, T. H. / Reactive magnetron sputtering of thin-film superconductor YBa 2Cu3O7-x . In: Applied Physics Letters. 1987 ; Vol. 51, No. 17. pp. 1370-1372.
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