Properties of the rf discharge in Ar-TEOS mixtures

R. Foest, R. Basner, M. Schmidt, F. Hempel, Kurt Becker

Research output: Chapter in Book/Report/Conference proceedingChapter (peer-reviewed)

Original languageEnglish (US)
Title of host publicationGaseous dielectrics VIII
EditorsL.G. Christophorou
Place of PublicationNew York
PublisherPlenum Press
Pages161-166
StatePublished - 1998

Cite this

Foest, R., Basner, R., Schmidt, M., Hempel, F., & Becker, K. (1998). Properties of the rf discharge in Ar-TEOS mixtures. In L. G. Christophorou (Ed.), Gaseous dielectrics VIII (pp. 161-166). Plenum Press.