Process flow innovations for photonic device integration in CMOS

Mark Beals, J. Michel, J. F. Liu, D. H. Ahn, D. Sparacin, R. Sun, C. Y. Hong, L. C. Kimerling, A. Pomerene, D. Carothers, J. Beattie, A. Kopa, A. Apsel, Mahmoud Rasras, D. M. Gill, S. S. Patel, K. Y. Tu, Y. K. Chen, A. E. White

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Multilevel thin film processing, global planarization and advanced photolithography enables the ability to integrate complimentary materials and process sequences required for high index contrast photonic components all within a single CMOS process flow. Developing high performance photonic components that can be integrated with electronic circuits at a high level of functionality in silicon CMOS is one of the basic objectives of the EPIC program sponsored by the Microsystems Technology Office (MTO) of DARPA. Our research team consisting of members from: BAE Systems, Alcatel-Lucent, Massachusetts Institute of Technology, Cornell University and Applied Wave Research reports on the latest developments of the technology to fabricate an application specific, electronic-photonic integrated circuit (AS_EPIC). Now in its second phase of the EPIC program, the team has designed, developed and integrated fourth order optical tunable filters, both silicon ring resonator and germanium electro-absorption modulators and germanium pin diode photodetectors using silicon waveguides within a full 150nm CMOS process flow for a broadband RF channelizer application. This presentation will review the latest advances of the passive and active photonic devices developed and the processes used for monolithic integration with CMOS processing. Examples include multilevel waveguides for optical interconnect and germanium epitaxy for active photonic devices such as p-i-n photodiodes and modulators.

Original languageEnglish (US)
Title of host publicationSilicon Photonics III
Volume6898
DOIs
StatePublished - Apr 21 2008
EventSilicon Photonics III - San Jose, CA, United States
Duration: Jan 21 2008Jan 24 2008

Other

OtherSilicon Photonics III
CountryUnited States
CitySan Jose, CA
Period1/21/081/24/08

Fingerprint

Germanium
Photonic devices
Silicon
Photonics
CMOS
Innovation
photonics
Modulators
Waveguides
Modulator
germanium
Waveguide
Optical interconnects
Microsystems
Monolithic Integration
Electronics
Photolithography
Planarization
Photonic Integrated Circuits
modulators

Keywords

  • CMOS
  • Detectors
  • EPIC
  • Filters
  • Integration
  • Modulators
  • Photonics
  • Waveguides

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

Cite this

Beals, M., Michel, J., Liu, J. F., Ahn, D. H., Sparacin, D., Sun, R., ... White, A. E. (2008). Process flow innovations for photonic device integration in CMOS. In Silicon Photonics III (Vol. 6898). [689804] https://doi.org/10.1117/12.774576

Process flow innovations for photonic device integration in CMOS. / Beals, Mark; Michel, J.; Liu, J. F.; Ahn, D. H.; Sparacin, D.; Sun, R.; Hong, C. Y.; Kimerling, L. C.; Pomerene, A.; Carothers, D.; Beattie, J.; Kopa, A.; Apsel, A.; Rasras, Mahmoud; Gill, D. M.; Patel, S. S.; Tu, K. Y.; Chen, Y. K.; White, A. E.

Silicon Photonics III. Vol. 6898 2008. 689804.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Beals, M, Michel, J, Liu, JF, Ahn, DH, Sparacin, D, Sun, R, Hong, CY, Kimerling, LC, Pomerene, A, Carothers, D, Beattie, J, Kopa, A, Apsel, A, Rasras, M, Gill, DM, Patel, SS, Tu, KY, Chen, YK & White, AE 2008, Process flow innovations for photonic device integration in CMOS. in Silicon Photonics III. vol. 6898, 689804, Silicon Photonics III, San Jose, CA, United States, 1/21/08. https://doi.org/10.1117/12.774576
Beals M, Michel J, Liu JF, Ahn DH, Sparacin D, Sun R et al. Process flow innovations for photonic device integration in CMOS. In Silicon Photonics III. Vol. 6898. 2008. 689804 https://doi.org/10.1117/12.774576
Beals, Mark ; Michel, J. ; Liu, J. F. ; Ahn, D. H. ; Sparacin, D. ; Sun, R. ; Hong, C. Y. ; Kimerling, L. C. ; Pomerene, A. ; Carothers, D. ; Beattie, J. ; Kopa, A. ; Apsel, A. ; Rasras, Mahmoud ; Gill, D. M. ; Patel, S. S. ; Tu, K. Y. ; Chen, Y. K. ; White, A. E. / Process flow innovations for photonic device integration in CMOS. Silicon Photonics III. Vol. 6898 2008.
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