Pixellated photonic crystal films by selective photopolymerization

Seung Kon Lee, Gi Ra Yi, Jun Hyuk Moon, Seung Man Yang, David J. Pine

Research output: Contribution to journalArticle

Abstract

Polymeric inverse opal films were prepared by using a negative photoresist of SU 8 and silica colloidal films as sacrificial templates. The composite films were produced by infiltrating the same photoresist resin through the macropores of the inverse opal scaffold. High resolution patterns at the micrometer scale were obtained by using conventional photolithography. It was observed that the residual polymer in the macropores increased with he UV exposure time and thus the effective refractive index also increased. Irradiation energy caused a incomplete curing of the photoresist that was back-filled into the macropores. A scanning electron microscopy image of a patterned inverse opal film showed the clear boundary between exposed and unexposed macropores region.

Original languageEnglish (US)
Pages (from-to)2111-2116
Number of pages6
JournalAdvanced Materials
Volume18
Issue number16
DOIs
StatePublished - Aug 18 2006

Fingerprint

Photopolymerization
Photoresists
Photonic crystals
Photolithography
Composite films
Scaffolds
Silicon Dioxide
Curing
Refractive index
Polymers
Resins
Silica
Irradiation
Scanning electron microscopy

ASJC Scopus subject areas

  • Materials Science(all)

Cite this

Pixellated photonic crystal films by selective photopolymerization. / Lee, Seung Kon; Yi, Gi Ra; Moon, Jun Hyuk; Yang, Seung Man; Pine, David J.

In: Advanced Materials, Vol. 18, No. 16, 18.08.2006, p. 2111-2116.

Research output: Contribution to journalArticle

Lee, Seung Kon ; Yi, Gi Ra ; Moon, Jun Hyuk ; Yang, Seung Man ; Pine, David J. / Pixellated photonic crystal films by selective photopolymerization. In: Advanced Materials. 2006 ; Vol. 18, No. 16. pp. 2111-2116.
@article{c274ec238f2a431297874b1eb5022950,
title = "Pixellated photonic crystal films by selective photopolymerization",
abstract = "Polymeric inverse opal films were prepared by using a negative photoresist of SU 8 and silica colloidal films as sacrificial templates. The composite films were produced by infiltrating the same photoresist resin through the macropores of the inverse opal scaffold. High resolution patterns at the micrometer scale were obtained by using conventional photolithography. It was observed that the residual polymer in the macropores increased with he UV exposure time and thus the effective refractive index also increased. Irradiation energy caused a incomplete curing of the photoresist that was back-filled into the macropores. A scanning electron microscopy image of a patterned inverse opal film showed the clear boundary between exposed and unexposed macropores region.",
author = "Lee, {Seung Kon} and Yi, {Gi Ra} and Moon, {Jun Hyuk} and Yang, {Seung Man} and Pine, {David J.}",
year = "2006",
month = "8",
day = "18",
doi = "10.1002/adma.200502630",
language = "English (US)",
volume = "18",
pages = "2111--2116",
journal = "Advanced Materials",
issn = "0935-9648",
publisher = "Wiley-VCH Verlag",
number = "16",

}

TY - JOUR

T1 - Pixellated photonic crystal films by selective photopolymerization

AU - Lee, Seung Kon

AU - Yi, Gi Ra

AU - Moon, Jun Hyuk

AU - Yang, Seung Man

AU - Pine, David J.

PY - 2006/8/18

Y1 - 2006/8/18

N2 - Polymeric inverse opal films were prepared by using a negative photoresist of SU 8 and silica colloidal films as sacrificial templates. The composite films were produced by infiltrating the same photoresist resin through the macropores of the inverse opal scaffold. High resolution patterns at the micrometer scale were obtained by using conventional photolithography. It was observed that the residual polymer in the macropores increased with he UV exposure time and thus the effective refractive index also increased. Irradiation energy caused a incomplete curing of the photoresist that was back-filled into the macropores. A scanning electron microscopy image of a patterned inverse opal film showed the clear boundary between exposed and unexposed macropores region.

AB - Polymeric inverse opal films were prepared by using a negative photoresist of SU 8 and silica colloidal films as sacrificial templates. The composite films were produced by infiltrating the same photoresist resin through the macropores of the inverse opal scaffold. High resolution patterns at the micrometer scale were obtained by using conventional photolithography. It was observed that the residual polymer in the macropores increased with he UV exposure time and thus the effective refractive index also increased. Irradiation energy caused a incomplete curing of the photoresist that was back-filled into the macropores. A scanning electron microscopy image of a patterned inverse opal film showed the clear boundary between exposed and unexposed macropores region.

UR - http://www.scopus.com/inward/record.url?scp=33748300894&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=33748300894&partnerID=8YFLogxK

U2 - 10.1002/adma.200502630

DO - 10.1002/adma.200502630

M3 - Article

AN - SCOPUS:33748300894

VL - 18

SP - 2111

EP - 2116

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 16

ER -