Physical and electrical characterization of the interface between atomic-layer-deposited Al2O3 on GaAs substrates for CMOS applications

D. I. Garcia-Gutierrez, V. Kaushik, Davood Shahrjerdi, S. K. Banerjee

Research output: Contribution to journalArticle

Original languageEnglish (US)
Pages (from-to)446-447
Number of pages2
JournalMicroscopy and Microanalysis
Volume14
Issue numberSUPPL. 2
DOIs
StatePublished - Aug 2008

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CMOS
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  • Instrumentation

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Physical and electrical characterization of the interface between atomic-layer-deposited Al2O3 on GaAs substrates for CMOS applications. / Garcia-Gutierrez, D. I.; Kaushik, V.; Shahrjerdi, Davood; Banerjee, S. K.

In: Microscopy and Microanalysis, Vol. 14, No. SUPPL. 2, 08.2008, p. 446-447.

Research output: Contribution to journalArticle

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