Photolithographic surface micromachining of polydimethylsiloxane (PDMS)

Weiqiang Chen, Raymond H W Lam, Jianping Fu

Research output: Contribution to journalArticle

Abstract

A major technical hurdle in microfluidics is the difficulty in achieving high fidelity lithographic patterning on polydimethylsiloxane (PDMS). Here, we report a simple yet highly precise and repeatable PDMS surface micromachining method using direct photolithography followed by reactive ion etching (RIE). Our method to achieve surface patterning of PDMS applied an O 2 plasma treatment to PDMS to activate its surface to overcome the challenge of poor photoresist adhesion on PDMS for photolithography. Our photolithographic PDMS surface micromachining technique is compatible with conventional soft lithography techniques and other silicon-based surface and bulk micromachining methods. To illustrate the general application of our method, we demonstrated fabrication of large microfiltration membranes and free-standing beam structures in PDMS.

Original languageEnglish (US)
Pages (from-to)391-395
Number of pages5
JournalLab on a Chip - Miniaturisation for Chemistry and Biology
Volume12
Issue number2
DOIs
StatePublished - Jan 21 2012

Fingerprint

Microtechnology
Surface micromachining
Polydimethylsiloxane
Photolithography
Microfiltration
Microfluidics
Reactive ion etching
Micromachining
Silicon
Photoresists
baysilon
Lithography
Adhesion
Ions
Membranes
Plasmas
Fabrication

ASJC Scopus subject areas

  • Biochemistry
  • Chemistry(all)
  • Bioengineering
  • Biomedical Engineering

Cite this

Photolithographic surface micromachining of polydimethylsiloxane (PDMS). / Chen, Weiqiang; Lam, Raymond H W; Fu, Jianping.

In: Lab on a Chip - Miniaturisation for Chemistry and Biology, Vol. 12, No. 2, 21.01.2012, p. 391-395.

Research output: Contribution to journalArticle

@article{5d45e81eb8b2411690ccd58d6ced9da9,
title = "Photolithographic surface micromachining of polydimethylsiloxane (PDMS)",
abstract = "A major technical hurdle in microfluidics is the difficulty in achieving high fidelity lithographic patterning on polydimethylsiloxane (PDMS). Here, we report a simple yet highly precise and repeatable PDMS surface micromachining method using direct photolithography followed by reactive ion etching (RIE). Our method to achieve surface patterning of PDMS applied an O 2 plasma treatment to PDMS to activate its surface to overcome the challenge of poor photoresist adhesion on PDMS for photolithography. Our photolithographic PDMS surface micromachining technique is compatible with conventional soft lithography techniques and other silicon-based surface and bulk micromachining methods. To illustrate the general application of our method, we demonstrated fabrication of large microfiltration membranes and free-standing beam structures in PDMS.",
author = "Weiqiang Chen and Lam, {Raymond H W} and Jianping Fu",
year = "2012",
month = "1",
day = "21",
doi = "10.1039/c1lc20721k",
language = "English (US)",
volume = "12",
pages = "391--395",
journal = "Lab on a Chip - Miniaturisation for Chemistry and Biology",
issn = "1473-0197",
publisher = "Royal Society of Chemistry",
number = "2",

}

TY - JOUR

T1 - Photolithographic surface micromachining of polydimethylsiloxane (PDMS)

AU - Chen, Weiqiang

AU - Lam, Raymond H W

AU - Fu, Jianping

PY - 2012/1/21

Y1 - 2012/1/21

N2 - A major technical hurdle in microfluidics is the difficulty in achieving high fidelity lithographic patterning on polydimethylsiloxane (PDMS). Here, we report a simple yet highly precise and repeatable PDMS surface micromachining method using direct photolithography followed by reactive ion etching (RIE). Our method to achieve surface patterning of PDMS applied an O 2 plasma treatment to PDMS to activate its surface to overcome the challenge of poor photoresist adhesion on PDMS for photolithography. Our photolithographic PDMS surface micromachining technique is compatible with conventional soft lithography techniques and other silicon-based surface and bulk micromachining methods. To illustrate the general application of our method, we demonstrated fabrication of large microfiltration membranes and free-standing beam structures in PDMS.

AB - A major technical hurdle in microfluidics is the difficulty in achieving high fidelity lithographic patterning on polydimethylsiloxane (PDMS). Here, we report a simple yet highly precise and repeatable PDMS surface micromachining method using direct photolithography followed by reactive ion etching (RIE). Our method to achieve surface patterning of PDMS applied an O 2 plasma treatment to PDMS to activate its surface to overcome the challenge of poor photoresist adhesion on PDMS for photolithography. Our photolithographic PDMS surface micromachining technique is compatible with conventional soft lithography techniques and other silicon-based surface and bulk micromachining methods. To illustrate the general application of our method, we demonstrated fabrication of large microfiltration membranes and free-standing beam structures in PDMS.

UR - http://www.scopus.com/inward/record.url?scp=84055207550&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84055207550&partnerID=8YFLogxK

U2 - 10.1039/c1lc20721k

DO - 10.1039/c1lc20721k

M3 - Article

C2 - 22089984

AN - SCOPUS:84055207550

VL - 12

SP - 391

EP - 395

JO - Lab on a Chip - Miniaturisation for Chemistry and Biology

JF - Lab on a Chip - Miniaturisation for Chemistry and Biology

SN - 1473-0197

IS - 2

ER -