Patterning nano-square arrays using shear-aligned block copolymer thin films

S. Y. Kim, R. L. Davis, B. T. Michal, J. Gwyther, I. Manners, P. M. Chaikin, R. A. Register

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Original languageEnglish (US)
    Title of host publicationEngineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future
    PublisherAIChE
    Pages605-607
    Number of pages3
    Volume2
    ISBN (Print)9781634390392
    StatePublished - 2013
    EventEngineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future - San Francisco, United States
    Duration: Nov 3 2013Nov 8 2013

    Other

    OtherEngineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future
    CountryUnited States
    CitySan Francisco
    Period11/3/1311/8/13

    Fingerprint

    Block copolymers
    Thin films

    ASJC Scopus subject areas

    • Engineering(all)
    • Chemical Engineering(all)

    Cite this

    Kim, S. Y., Davis, R. L., Michal, B. T., Gwyther, J., Manners, I., Chaikin, P. M., & Register, R. A. (2013). Patterning nano-square arrays using shear-aligned block copolymer thin films. In Engineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future (Vol. 2, pp. 605-607). AIChE.

    Patterning nano-square arrays using shear-aligned block copolymer thin films. / Kim, S. Y.; Davis, R. L.; Michal, B. T.; Gwyther, J.; Manners, I.; Chaikin, P. M.; Register, R. A.

    Engineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future. Vol. 2 AIChE, 2013. p. 605-607.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Kim, SY, Davis, RL, Michal, BT, Gwyther, J, Manners, I, Chaikin, PM & Register, RA 2013, Patterning nano-square arrays using shear-aligned block copolymer thin films. in Engineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future. vol. 2, AIChE, pp. 605-607, Engineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future, San Francisco, United States, 11/3/13.
    Kim SY, Davis RL, Michal BT, Gwyther J, Manners I, Chaikin PM et al. Patterning nano-square arrays using shear-aligned block copolymer thin films. In Engineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future. Vol. 2. AIChE. 2013. p. 605-607
    Kim, S. Y. ; Davis, R. L. ; Michal, B. T. ; Gwyther, J. ; Manners, I. ; Chaikin, P. M. ; Register, R. A. / Patterning nano-square arrays using shear-aligned block copolymer thin films. Engineering Sciences and Fundamentals 2013 - Core Programming Area at the 2013 AIChE Annual Meeting: Global Challenges for Engineering a Sustainable Future. Vol. 2 AIChE, 2013. pp. 605-607
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