On the utility of Run to Run control in semiconductor manufacturing

John Musacchio, Sundeep Rangan, Costas Spanos, Kameshwar Poolla

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Run to Run (RTR) control uses data from past process runs to adjust settings for the next run. By making better use of existing in-line metrology and actuation capabilities, RTR control offers the potential of reducing variability in manufacturing with minimal capital cost. In this paper, we survey the types of equipment models that Can be used for RTR control, compare existing RTR control algorithms, and discuss issues affecting the potential utility of RTR control.

Original languageEnglish (US)
Title of host publicationIEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings
Editors Anon
PublisherIEEE
StatePublished - 1997
EventProceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference - San Francisco, CA, USA
Duration: Oct 6 1997Oct 8 1997

Other

OtherProceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference
CitySan Francisco, CA, USA
Period10/6/9710/8/97

Fingerprint

Semiconductor materials
Costs

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Industrial and Manufacturing Engineering

Cite this

Musacchio, J., Rangan, S., Spanos, C., & Poolla, K. (1997). On the utility of Run to Run control in semiconductor manufacturing. In Anon (Ed.), IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings IEEE.

On the utility of Run to Run control in semiconductor manufacturing. / Musacchio, John; Rangan, Sundeep; Spanos, Costas; Poolla, Kameshwar.

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings. ed. / Anon. IEEE, 1997.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Musacchio, J, Rangan, S, Spanos, C & Poolla, K 1997, On the utility of Run to Run control in semiconductor manufacturing. in Anon (ed.), IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings. IEEE, Proceedings of the 1997 IEEE International Symposium on Semiconductor on Manufacturing Conference, San Francisco, CA, USA, 10/6/97.
Musacchio J, Rangan S, Spanos C, Poolla K. On the utility of Run to Run control in semiconductor manufacturing. In Anon, editor, IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings. IEEE. 1997
Musacchio, John ; Rangan, Sundeep ; Spanos, Costas ; Poolla, Kameshwar. / On the utility of Run to Run control in semiconductor manufacturing. IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings. editor / Anon. IEEE, 1997.
@inproceedings{153199ce48654086bb22ad01d8a5311b,
title = "On the utility of Run to Run control in semiconductor manufacturing",
abstract = "Run to Run (RTR) control uses data from past process runs to adjust settings for the next run. By making better use of existing in-line metrology and actuation capabilities, RTR control offers the potential of reducing variability in manufacturing with minimal capital cost. In this paper, we survey the types of equipment models that Can be used for RTR control, compare existing RTR control algorithms, and discuss issues affecting the potential utility of RTR control.",
author = "John Musacchio and Sundeep Rangan and Costas Spanos and Kameshwar Poolla",
year = "1997",
language = "English (US)",
editor = "Anon",
booktitle = "IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings",
publisher = "IEEE",

}

TY - GEN

T1 - On the utility of Run to Run control in semiconductor manufacturing

AU - Musacchio, John

AU - Rangan, Sundeep

AU - Spanos, Costas

AU - Poolla, Kameshwar

PY - 1997

Y1 - 1997

N2 - Run to Run (RTR) control uses data from past process runs to adjust settings for the next run. By making better use of existing in-line metrology and actuation capabilities, RTR control offers the potential of reducing variability in manufacturing with minimal capital cost. In this paper, we survey the types of equipment models that Can be used for RTR control, compare existing RTR control algorithms, and discuss issues affecting the potential utility of RTR control.

AB - Run to Run (RTR) control uses data from past process runs to adjust settings for the next run. By making better use of existing in-line metrology and actuation capabilities, RTR control offers the potential of reducing variability in manufacturing with minimal capital cost. In this paper, we survey the types of equipment models that Can be used for RTR control, compare existing RTR control algorithms, and discuss issues affecting the potential utility of RTR control.

UR - http://www.scopus.com/inward/record.url?scp=0031344280&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031344280&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:0031344280

BT - IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

A2 - Anon, null

PB - IEEE

ER -