NOVEL TECHNIQUE FOR PREPARATION OF TUNNEL JUNCTION BARRIERS USING ELECTROCHEMICAL ANODIZATION.

R. W. Simon, P. M. Chaikin, S. A. Wolf

    Research output: Contribution to journalArticle

    Abstract

    A novel method has been developed for preparing both Josephson and single particle tunnel junctions. This technique has been applied to Sn-Sn//xO//y-metal films where the tin oxide barrier is formed on the surface of a freshly evaporated Sn film by electrochemical anodization. By varying the anodization parameters, the junction resistances can be controlled over more than three orders of magnitude: i. e. , from less than 10** minus **4 ohm-cm**2 to 0. 1 ohm-cm**2. In each instance, high quality junctions with nearly ideal I-V characteristics and low leakage currents have been produced. Low resistance Josephson junctions have been fabricated whose critical currents scale with junction resistance and modulate with applied magnetic field in the familiar Fraunhofer-like diffraction pattern.

    Original languageEnglish (US)
    Pages (from-to)957-959
    Number of pages3
    JournalIEEE Transactions on Magnetics
    VolumeMAG-19
    Issue number3 Pt 2
    StatePublished - May 1982

    Fingerprint

    Tunnel junctions
    tunnel junctions
    preparation
    Critical currents
    Tin oxides
    Leakage currents
    Diffraction patterns
    Metals
    low resistance
    Magnetic fields
    metal films
    Josephson junctions
    tin oxides
    critical current
    leakage
    diffraction patterns
    magnetic fields
    stannic oxide

    ASJC Scopus subject areas

    • Electrical and Electronic Engineering
    • Physics and Astronomy (miscellaneous)

    Cite this

    NOVEL TECHNIQUE FOR PREPARATION OF TUNNEL JUNCTION BARRIERS USING ELECTROCHEMICAL ANODIZATION. / Simon, R. W.; Chaikin, P. M.; Wolf, S. A.

    In: IEEE Transactions on Magnetics, Vol. MAG-19, No. 3 Pt 2, 05.1982, p. 957-959.

    Research output: Contribution to journalArticle

    Simon, RW, Chaikin, PM & Wolf, SA 1982, 'NOVEL TECHNIQUE FOR PREPARATION OF TUNNEL JUNCTION BARRIERS USING ELECTROCHEMICAL ANODIZATION.', IEEE Transactions on Magnetics, vol. MAG-19, no. 3 Pt 2, pp. 957-959.
    Simon, R. W. ; Chaikin, P. M. ; Wolf, S. A. / NOVEL TECHNIQUE FOR PREPARATION OF TUNNEL JUNCTION BARRIERS USING ELECTROCHEMICAL ANODIZATION. In: IEEE Transactions on Magnetics. 1982 ; Vol. MAG-19, No. 3 Pt 2. pp. 957-959.
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