Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges

Eray Aydil, Denise C. Marra

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Original languageEnglish (US)
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 1998
Subtitle of host publication1998 International Microprocesses and Nanotechnology Conference
EditorsHyung Joon Yoo, Shinji Okazaki, Jinho Ahn, Ohyun Kim, Masanori Komuro
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages6-7
Number of pages2
Volume1998-July
ISBN (Electronic)4930813832, 9784930813831
DOIs
StatePublished - Jan 1 1998
Event1998 International Microprocesses and Nanotechnology Conference, MNC 1998 - Kyoungju, Korea, Republic of
Duration: Jul 13 1998Jul 16 1998

Other

Other1998 International Microprocesses and Nanotechnology Conference, MNC 1998
CountryKorea, Republic of
CityKyoungju
Period7/13/987/16/98

Fingerprint

Fluorocarbons
Plasma etching
fluorocarbons
plasma etching
Silica
silicon dioxide
Silicon
silicon

ASJC Scopus subject areas

  • Materials Science(all)
  • Nuclear and High Energy Physics
  • Computer Science Applications

Cite this

Aydil, E., & Marra, D. C. (1998). Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges. In H. J. Yoo, S. Okazaki, J. Ahn, O. Kim, & M. Komuro (Eds.), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference (Vol. 1998-July, pp. 6-7). [729911] Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.1998.729911

Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges. / Aydil, Eray; Marra, Denise C.

Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. ed. / Hyung Joon Yoo; Shinji Okazaki; Jinho Ahn; Ohyun Kim; Masanori Komuro. Vol. 1998-July Institute of Electrical and Electronics Engineers Inc., 1998. p. 6-7 729911.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Aydil, E & Marra, DC 1998, Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges. in HJ Yoo, S Okazaki, J Ahn, O Kim & M Komuro (eds), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. vol. 1998-July, 729911, Institute of Electrical and Electronics Engineers Inc., pp. 6-7, 1998 International Microprocesses and Nanotechnology Conference, MNC 1998, Kyoungju, Korea, Republic of, 7/13/98. https://doi.org/10.1109/IMNC.1998.729911
Aydil E, Marra DC. Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges. In Yoo HJ, Okazaki S, Ahn J, Kim O, Komuro M, editors, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. Vol. 1998-July. Institute of Electrical and Electronics Engineers Inc. 1998. p. 6-7. 729911 https://doi.org/10.1109/IMNC.1998.729911
Aydil, Eray ; Marra, Denise C. / Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges. Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. editor / Hyung Joon Yoo ; Shinji Okazaki ; Jinho Ahn ; Ohyun Kim ; Masanori Komuro. Vol. 1998-July Institute of Electrical and Electronics Engineers Inc., 1998. pp. 6-7
@inproceedings{f921d706f60942c2aa670aeb730c34b3,
title = "Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges",
author = "Eray Aydil and Marra, {Denise C.}",
year = "1998",
month = "1",
day = "1",
doi = "10.1109/IMNC.1998.729911",
language = "English (US)",
volume = "1998-July",
pages = "6--7",
editor = "Yoo, {Hyung Joon} and Shinji Okazaki and Jinho Ahn and Ohyun Kim and Masanori Komuro",
booktitle = "Digest of Papers - Microprocesses and Nanotechnology 1998",
publisher = "Institute of Electrical and Electronics Engineers Inc.",

}

TY - GEN

T1 - Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges

AU - Aydil, Eray

AU - Marra, Denise C.

PY - 1998/1/1

Y1 - 1998/1/1

UR - http://www.scopus.com/inward/record.url?scp=85051419404&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85051419404&partnerID=8YFLogxK

U2 - 10.1109/IMNC.1998.729911

DO - 10.1109/IMNC.1998.729911

M3 - Conference contribution

AN - SCOPUS:85051419404

VL - 1998-July

SP - 6

EP - 7

BT - Digest of Papers - Microprocesses and Nanotechnology 1998

A2 - Yoo, Hyung Joon

A2 - Okazaki, Shinji

A2 - Ahn, Jinho

A2 - Kim, Ohyun

A2 - Komuro, Masanori

PB - Institute of Electrical and Electronics Engineers Inc.

ER -