Multiple-exposure holographic lithography with phase shift

Jun Hyuk Moon, Seung Man Yang, David J. Pine, Won Seok Chang

Research output: Contribution to journalArticle

Abstract

We demonstrated a multiple-exposure holographic lithography with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties.

Original languageEnglish (US)
Pages (from-to)4184-4186
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number18
DOIs
StatePublished - Nov 1 2004

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

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