Multiple-exposure holographic lithography with phase shift

Jun Hyuk Moon, Seung Man Yang, David J. Pine, Won Seok Chang

Research output: Contribution to journalArticle

Abstract

We demonstrated a multiple-exposure holographic lithography with phase shift. The phase shift was utilized to translate two-dimensional (2D) and three-dimensional (3D) interference patterns. The multiple exposure of the interference patterns with a controlled phase shift created partially overlapped patterns, resulting in 2D and 3D polymer lattices of shape-anisotropic atoms. This approach can be used to design directly the unit atoms in periodic patterns for tunable optical properties.

Original languageEnglish (US)
Pages (from-to)4184-4186
Number of pages3
JournalApplied Physics Letters
Volume85
Issue number18
DOIs
StatePublished - Nov 1 2004

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phase shift
lithography
interference
atoms
optical properties
polymers

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Multiple-exposure holographic lithography with phase shift. / Moon, Jun Hyuk; Yang, Seung Man; Pine, David J.; Chang, Won Seok.

In: Applied Physics Letters, Vol. 85, No. 18, 01.11.2004, p. 4184-4186.

Research output: Contribution to journalArticle

Moon, Jun Hyuk ; Yang, Seung Man ; Pine, David J. ; Chang, Won Seok. / Multiple-exposure holographic lithography with phase shift. In: Applied Physics Letters. 2004 ; Vol. 85, No. 18. pp. 4184-4186.
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