Monte Carlo simulation of electron behavior in an electron cyclotron resonance discharge

S. C. Kuo, E. E. Kunhardt, Spencer Kuo

Research output: Contribution to journalArticle

Abstract

Electron behavior in an electron cyclotron resonance microwave discharge maintained by the TM01 mode fields of a cylindrical waveguide has been investigated via a Monte Carlo simulation. Since this discharge has high degree of ionization (≥1%), a self-consistent simulation of the plasma dynamics is achieved through the use of the ponderomotive and grad B (-μ∇B) forces. Accumulation of negative charges on the boundary surface sets up a sheath whose influence is also taken into account. The time averaged, spatially dependent electron energy distribution (EED) is computed self-consistently by integrating electron trajectories subjected to the microwave fields, the divergent background magnetic field, the space charge field, and the sheath field, and taking into account electron-electron collisions and collisions with the neutral hydrogen atoms. The EED is characterized by two electron temperatures with the population of the tail increasing for decreasing pressure. At low pressures (∼0.5 mTorr), the sheath potential is on the order of 100 V and decreases with increasing pressure. This observation suggests a pressure range for operation of reactors for diamondlike carbon film deposition.

Original languageEnglish (US)
Pages (from-to)4197-4204
Number of pages8
JournalJournal of Applied Physics
Volume73
Issue number9
DOIs
StatePublished - 1993

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electron cyclotron resonance
sheaths
electron energy
energy distribution
microwaves
plasma dynamics
electron trajectories
electrons
simulation
neutral atoms
space charge
hydrogen atoms
electron scattering
low pressure
reactors
waveguides
ionization
collisions
carbon
magnetic fields

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Cite this

Monte Carlo simulation of electron behavior in an electron cyclotron resonance discharge. / Kuo, S. C.; Kunhardt, E. E.; Kuo, Spencer.

In: Journal of Applied Physics, Vol. 73, No. 9, 1993, p. 4197-4204.

Research output: Contribution to journalArticle

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