Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition

E. Koretzky, Spencer Kuo, S. C. Kuo

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Monte Carlo simulation of electron behavior in an ECR (electron cyclotron resonance) microwave discharge maintained by the TM11 mode field of a cylindrical waveguide has been performed. Results show that at low pressure, the temperature of the tail portion of the FED (electron energy distribution) exceeds 40eV, and the sheath potential is about -200V. These results are about twice as high as the previous results using TM01 mode fields. The produced ECR plasma is aimed at assisting the growth of polycrystalline diamond films and DLC films.

Original languageEnglish (US)
Title of host publicationIEEE International Conference on Plasma Science
PublisherIEEE
Pages137
Number of pages1
StatePublished - 1996
EventProceedings of the 1996 IEEE International Conference on Plasma Science - Boston, MA, USA
Duration: Jun 3 1996Jun 5 1996

Other

OtherProceedings of the 1996 IEEE International Conference on Plasma Science
CityBoston, MA, USA
Period6/3/966/5/96

Fingerprint

electron cyclotron resonance
thin films
diamond films
sheaths
energy distribution
low pressure
simulation
electron energy
waveguides
microwaves
electrons
temperature

ASJC Scopus subject areas

  • Condensed Matter Physics

Cite this

Koretzky, E., Kuo, S., & Kuo, S. C. (1996). Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition. In IEEE International Conference on Plasma Science (pp. 137). IEEE.

Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition. / Koretzky, E.; Kuo, Spencer; Kuo, S. C.

IEEE International Conference on Plasma Science. IEEE, 1996. p. 137.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Koretzky, E, Kuo, S & Kuo, SC 1996, Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition. in IEEE International Conference on Plasma Science. IEEE, pp. 137, Proceedings of the 1996 IEEE International Conference on Plasma Science, Boston, MA, USA, 6/3/96.
Koretzky E, Kuo S, Kuo SC. Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition. In IEEE International Conference on Plasma Science. IEEE. 1996. p. 137
Koretzky, E. ; Kuo, Spencer ; Kuo, S. C. / Monte Carlo simulation and experimental study of an electron cyclotron resonance plasma for thin film deposition. IEEE International Conference on Plasma Science. IEEE, 1996. pp. 137
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