Molecular dynamics study of the interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces

Shyam Ramalingam, Eray Aydil, Dimitrios Maroudas

Research output: Contribution to journalConference article

Abstract

The interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces observed in various plasmas were studied using molecular dynamics. Hydrogenated amorphous silicon film growth rates were obtained by employing a unit reaction probability for clusters of different sizes on silicon surfaces. Results showed that the clusters react with surface of amorphous silicon films and crystalline surfaces with high probability. The energetics and structures of adsorbed cluster configurations on these surfaces were also analyzed.

Original languageEnglish (US)
Pages (from-to)634-644
Number of pages11
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume19
Issue number3
DOIs
StatePublished - Jan 1 2001
Event13th International Vaccum Microelectronics Conference - Guangzhou, China
Duration: Aug 14 2000Aug 17 2000

Fingerprint

Amorphous silicon
amorphous silicon
Molecular dynamics
molecular dynamics
Crystalline materials
Silicon
silicon
silicon films
interactions
Film growth
Hot Temperature
Plasmas
configurations

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

@article{e01406f2088749e5a69032b78d20b9ec,
title = "Molecular dynamics study of the interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces",
abstract = "The interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces observed in various plasmas were studied using molecular dynamics. Hydrogenated amorphous silicon film growth rates were obtained by employing a unit reaction probability for clusters of different sizes on silicon surfaces. Results showed that the clusters react with surface of amorphous silicon films and crystalline surfaces with high probability. The energetics and structures of adsorbed cluster configurations on these surfaces were also analyzed.",
author = "Shyam Ramalingam and Eray Aydil and Dimitrios Maroudas",
year = "2001",
month = "1",
day = "1",
doi = "10.1116/1.1362682",
language = "English (US)",
volume = "19",
pages = "634--644",
journal = "Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "3",

}

TY - JOUR

T1 - Molecular dynamics study of the interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces

AU - Ramalingam, Shyam

AU - Aydil, Eray

AU - Maroudas, Dimitrios

PY - 2001/1/1

Y1 - 2001/1/1

N2 - The interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces observed in various plasmas were studied using molecular dynamics. Hydrogenated amorphous silicon film growth rates were obtained by employing a unit reaction probability for clusters of different sizes on silicon surfaces. Results showed that the clusters react with surface of amorphous silicon films and crystalline surfaces with high probability. The energetics and structures of adsorbed cluster configurations on these surfaces were also analyzed.

AB - The interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces observed in various plasmas were studied using molecular dynamics. Hydrogenated amorphous silicon film growth rates were obtained by employing a unit reaction probability for clusters of different sizes on silicon surfaces. Results showed that the clusters react with surface of amorphous silicon films and crystalline surfaces with high probability. The energetics and structures of adsorbed cluster configurations on these surfaces were also analyzed.

UR - http://www.scopus.com/inward/record.url?scp=0035326404&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035326404&partnerID=8YFLogxK

U2 - 10.1116/1.1362682

DO - 10.1116/1.1362682

M3 - Conference article

AN - SCOPUS:0035326404

VL - 19

SP - 634

EP - 644

JO - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

JF - Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena

SN - 1071-1023

IS - 3

ER -