Modeling MOCVD growth of YBCO thin films

Tak Shing Lo, Robert Kohn

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We develop a new approach to the modeling of thin film growth. Our model treats the adatom density on the surface of the film as an explicit unknown. This approach (1) clarifies the role of the "uphill current" associated with the Schwoebel barrier; (2) facilitates simple, physically natural coupling to the mechanism of deposition; and (3) permits discussion of multispecies effects. Our implementation focuses on spiral mode growth of YBCO thin films, with MOCVD (metallorganic chemical vapor deposition) as the deposition mechanism.

Original languageEnglish (US)
Title of host publicationMaterials Research Society Symposium - Proceedings
EditorsS Moss, D Poker, D Ila
Volume648
StatePublished - 2001
EventGrowth, Evolution and Properties of Surfaces, Thin Films and Self-Organized Strutures - Boston, MA, United States
Duration: Nov 27 2000Dec 1 2000

Other

OtherGrowth, Evolution and Properties of Surfaces, Thin Films and Self-Organized Strutures
CountryUnited States
CityBoston, MA
Period11/27/0012/1/00

Fingerprint

Metallorganic chemical vapor deposition
Thin films
Adatoms
Film growth

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

Cite this

Lo, T. S., & Kohn, R. (2001). Modeling MOCVD growth of YBCO thin films. In S. Moss, D. Poker, & D. Ila (Eds.), Materials Research Society Symposium - Proceedings (Vol. 648)

Modeling MOCVD growth of YBCO thin films. / Lo, Tak Shing; Kohn, Robert.

Materials Research Society Symposium - Proceedings. ed. / S Moss; D Poker; D Ila. Vol. 648 2001.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Lo, TS & Kohn, R 2001, Modeling MOCVD growth of YBCO thin films. in S Moss, D Poker & D Ila (eds), Materials Research Society Symposium - Proceedings. vol. 648, Growth, Evolution and Properties of Surfaces, Thin Films and Self-Organized Strutures, Boston, MA, United States, 11/27/00.
Lo TS, Kohn R. Modeling MOCVD growth of YBCO thin films. In Moss S, Poker D, Ila D, editors, Materials Research Society Symposium - Proceedings. Vol. 648. 2001
Lo, Tak Shing ; Kohn, Robert. / Modeling MOCVD growth of YBCO thin films. Materials Research Society Symposium - Proceedings. editor / S Moss ; D Poker ; D Ila. Vol. 648 2001.
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