Mechanism and activation energy barrier for H abstraction by H(D) from a-Si:H surfaces

Sumit Agarwal, Saravanapriyan Sriraman, Akihiro Takano, M. C M Van de Sanden, Eray Aydil, Dimitrios Maroudas

Research output: Contribution to journalArticle

Abstract

Hydrogen atoms are abstracted from the surface of hydrogenated amorphous silicon (a-Si:H) films by impinging H(D) atoms through an Eley-Rideal mechanism that is characterized by a zero activation energy barrier. This has been revealed by systematic analysis of the interactions of H(D) atoms with a-Si:H films during exposure to an H2(D2) plasma using synergistically molecular-dynamics simulations and attenuated total reflection Fourier transform infrared spectroscopy combined with spectroscopic ellipsometry. Understanding such interactions is of utmost importance in optimizing the plasma deposition of silicon thin films.

Original languageEnglish (US)
JournalSurface Science
Volume515
Issue number1
DOIs
StatePublished - Aug 1 2002

Fingerprint

Energy barriers
Activation energy
activation energy
Atoms
Hydrogen
ellipsometry
amorphous silicon
atoms
Plasma deposition
hydrogen atoms
Spectroscopic ellipsometry
infrared spectroscopy
Beam plasma interactions
interactions
Silicon
molecular dynamics
Amorphous silicon
Fourier transform infrared spectroscopy
Molecular dynamics
energy

Keywords

  • Amorphous surfaces
  • Hydrogen atom
  • Infrared absorption spectroscopy
  • Molecular dynamics
  • Plasma processing
  • Semiconductor-semiconductor thin film structures
  • Silicon
  • Surface chemical reaction

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Mechanism and activation energy barrier for H abstraction by H(D) from a-Si:H surfaces. / Agarwal, Sumit; Sriraman, Saravanapriyan; Takano, Akihiro; Van de Sanden, M. C M; Aydil, Eray; Maroudas, Dimitrios.

In: Surface Science, Vol. 515, No. 1, 01.08.2002.

Research output: Contribution to journalArticle

Agarwal, Sumit ; Sriraman, Saravanapriyan ; Takano, Akihiro ; Van de Sanden, M. C M ; Aydil, Eray ; Maroudas, Dimitrios. / Mechanism and activation energy barrier for H abstraction by H(D) from a-Si:H surfaces. In: Surface Science. 2002 ; Vol. 515, No. 1.
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