Large-area nanosquare arrays from shear-aligned block copolymer thin films

So Youn Kim, Adam Nunns, Jessica Gwyther, Raleigh L. Davis, Ian Manners, Paul M. Chaikin, Richard A. Register

    Research output: Contribution to journalArticle

    Abstract

    While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel stripes, can be produced by spontaneous self-assembly of simple diblock copolymers; even a simple square packing has heretofore required more intricate macromolecular architectures or nanoscale substrate prepatterning. In this study, we demonstrate that square, rectangular, and rhombic arrays can be created via shear-alignment of distinct layers of cylinder-forming block copolymers, coupled with cross-linking of the layers using ultraviolet light. Furthermore, these block copolymer arrays can in turn be used as templates to fabricate dense, substrate-supported arrays of nanostructures comprising a wide variety of elements: deep (>50 nm) nanowells, nanoposts, and thin metal nanodots (3 nm thick, 35 nm pitch) are all demonstrated.

    Original languageEnglish (US)
    Pages (from-to)5698-5705
    Number of pages8
    JournalNano Letters
    Volume14
    Issue number10
    DOIs
    StatePublished - Oct 8 2014

    Fingerprint

    block copolymers
    Block copolymers
    shear
    Thin films
    thin films
    ultraviolet radiation
    self assembly
    copolymers
    Substrates
    templates
    lithography
    alignment
    Self assembly
    Lithography
    Nanostructures
    Metals
    symmetry
    metals

    Keywords

    • Block copolymer lithography
    • metal dots
    • nanopatterning
    • square arrays

    ASJC Scopus subject areas

    • Condensed Matter Physics
    • Bioengineering
    • Chemistry(all)
    • Materials Science(all)
    • Mechanical Engineering

    Cite this

    Kim, S. Y., Nunns, A., Gwyther, J., Davis, R. L., Manners, I., Chaikin, P. M., & Register, R. A. (2014). Large-area nanosquare arrays from shear-aligned block copolymer thin films. Nano Letters, 14(10), 5698-5705. https://doi.org/10.1021/nl502416b

    Large-area nanosquare arrays from shear-aligned block copolymer thin films. / Kim, So Youn; Nunns, Adam; Gwyther, Jessica; Davis, Raleigh L.; Manners, Ian; Chaikin, Paul M.; Register, Richard A.

    In: Nano Letters, Vol. 14, No. 10, 08.10.2014, p. 5698-5705.

    Research output: Contribution to journalArticle

    Kim, SY, Nunns, A, Gwyther, J, Davis, RL, Manners, I, Chaikin, PM & Register, RA 2014, 'Large-area nanosquare arrays from shear-aligned block copolymer thin films', Nano Letters, vol. 14, no. 10, pp. 5698-5705. https://doi.org/10.1021/nl502416b
    Kim SY, Nunns A, Gwyther J, Davis RL, Manners I, Chaikin PM et al. Large-area nanosquare arrays from shear-aligned block copolymer thin films. Nano Letters. 2014 Oct 8;14(10):5698-5705. https://doi.org/10.1021/nl502416b
    Kim, So Youn ; Nunns, Adam ; Gwyther, Jessica ; Davis, Raleigh L. ; Manners, Ian ; Chaikin, Paul M. ; Register, Richard A. / Large-area nanosquare arrays from shear-aligned block copolymer thin films. In: Nano Letters. 2014 ; Vol. 14, No. 10. pp. 5698-5705.
    @article{c5f6136e174d45ebaf46f56ead6f9991,
    title = "Large-area nanosquare arrays from shear-aligned block copolymer thin films",
    abstract = "While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel stripes, can be produced by spontaneous self-assembly of simple diblock copolymers; even a simple square packing has heretofore required more intricate macromolecular architectures or nanoscale substrate prepatterning. In this study, we demonstrate that square, rectangular, and rhombic arrays can be created via shear-alignment of distinct layers of cylinder-forming block copolymers, coupled with cross-linking of the layers using ultraviolet light. Furthermore, these block copolymer arrays can in turn be used as templates to fabricate dense, substrate-supported arrays of nanostructures comprising a wide variety of elements: deep (>50 nm) nanowells, nanoposts, and thin metal nanodots (3 nm thick, 35 nm pitch) are all demonstrated.",
    keywords = "Block copolymer lithography, metal dots, nanopatterning, square arrays",
    author = "Kim, {So Youn} and Adam Nunns and Jessica Gwyther and Davis, {Raleigh L.} and Ian Manners and Chaikin, {Paul M.} and Register, {Richard A.}",
    year = "2014",
    month = "10",
    day = "8",
    doi = "10.1021/nl502416b",
    language = "English (US)",
    volume = "14",
    pages = "5698--5705",
    journal = "Nano Letters",
    issn = "1530-6984",
    publisher = "American Chemical Society",
    number = "10",

    }

    TY - JOUR

    T1 - Large-area nanosquare arrays from shear-aligned block copolymer thin films

    AU - Kim, So Youn

    AU - Nunns, Adam

    AU - Gwyther, Jessica

    AU - Davis, Raleigh L.

    AU - Manners, Ian

    AU - Chaikin, Paul M.

    AU - Register, Richard A.

    PY - 2014/10/8

    Y1 - 2014/10/8

    N2 - While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel stripes, can be produced by spontaneous self-assembly of simple diblock copolymers; even a simple square packing has heretofore required more intricate macromolecular architectures or nanoscale substrate prepatterning. In this study, we demonstrate that square, rectangular, and rhombic arrays can be created via shear-alignment of distinct layers of cylinder-forming block copolymers, coupled with cross-linking of the layers using ultraviolet light. Furthermore, these block copolymer arrays can in turn be used as templates to fabricate dense, substrate-supported arrays of nanostructures comprising a wide variety of elements: deep (>50 nm) nanowells, nanoposts, and thin metal nanodots (3 nm thick, 35 nm pitch) are all demonstrated.

    AB - While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel stripes, can be produced by spontaneous self-assembly of simple diblock copolymers; even a simple square packing has heretofore required more intricate macromolecular architectures or nanoscale substrate prepatterning. In this study, we demonstrate that square, rectangular, and rhombic arrays can be created via shear-alignment of distinct layers of cylinder-forming block copolymers, coupled with cross-linking of the layers using ultraviolet light. Furthermore, these block copolymer arrays can in turn be used as templates to fabricate dense, substrate-supported arrays of nanostructures comprising a wide variety of elements: deep (>50 nm) nanowells, nanoposts, and thin metal nanodots (3 nm thick, 35 nm pitch) are all demonstrated.

    KW - Block copolymer lithography

    KW - metal dots

    KW - nanopatterning

    KW - square arrays

    UR - http://www.scopus.com/inward/record.url?scp=84907880376&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=84907880376&partnerID=8YFLogxK

    U2 - 10.1021/nl502416b

    DO - 10.1021/nl502416b

    M3 - Article

    VL - 14

    SP - 5698

    EP - 5705

    JO - Nano Letters

    JF - Nano Letters

    SN - 1530-6984

    IS - 10

    ER -