Large area dense nanoscale patterning of arbitrary surfaces

Miri Park, P. M. Chaikin, Richard A. Register, Douglas H. Adamson

    Research output: Contribution to journalArticle

    Abstract

    We demonstrate a large-area fabrication of hexagonally ordered metal dot arrays with an area density of ∼ 10 11/cm 2. We produced 20 nm dots with a 40 nm period by combining block copolymer nanolithography and a trilayer resist technique. A self-assembled spherical-phase block copolymer top layer spontaneously generated the pattern, acting as a template. The pattern was first transferred to a silicon nitride middle layer by reactive ion etch, producing holes. The nitride layer was then used as a mask to further etch into a polyimide bottom layer. The metal dots were produced by an electron beam evaporation followed by a lift-off process. Our method provides a viable route for highly dense nanoscale patterning of different materials on arbitrary surfaces.

    Original languageEnglish (US)
    Pages (from-to)257-259
    Number of pages3
    JournalApplied Physics Letters
    Volume79
    Issue number2
    DOIs
    StatePublished - Jul 9 2001

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    block copolymers
    polyimides
    silicon nitrides
    metals
    nitrides
    masks
    templates
    routes
    evaporation
    electron beams
    fabrication
    ions

    ASJC Scopus subject areas

    • Physics and Astronomy (miscellaneous)

    Cite this

    Park, M., Chaikin, P. M., Register, R. A., & Adamson, D. H. (2001). Large area dense nanoscale patterning of arbitrary surfaces. Applied Physics Letters, 79(2), 257-259. https://doi.org/10.1063/1.1378046

    Large area dense nanoscale patterning of arbitrary surfaces. / Park, Miri; Chaikin, P. M.; Register, Richard A.; Adamson, Douglas H.

    In: Applied Physics Letters, Vol. 79, No. 2, 09.07.2001, p. 257-259.

    Research output: Contribution to journalArticle

    Park, M, Chaikin, PM, Register, RA & Adamson, DH 2001, 'Large area dense nanoscale patterning of arbitrary surfaces', Applied Physics Letters, vol. 79, no. 2, pp. 257-259. https://doi.org/10.1063/1.1378046
    Park, Miri ; Chaikin, P. M. ; Register, Richard A. ; Adamson, Douglas H. / Large area dense nanoscale patterning of arbitrary surfaces. In: Applied Physics Letters. 2001 ; Vol. 79, No. 2. pp. 257-259.
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