Investigation of diblock copolymer thin film morphology for nanolithography

Miri Park, Christopher Harrison, Paul M. Chaikin, Richard A. Register, Douglas Adamson, Nan Yao

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    The morphologies and ordering in thin polystyrene-polybutadiene (PS-PB) diblock copolymer films are studied on bare silicon and silicon nitride substrates, and also on polymethylmethacrylate (PMMA) coated substrates. The PS-PB copolymers are synthesized to form, in bulk, PB cylinders or spheres in a PS matrix. In thin films, prepared by spin-coating, it is observed that the morphology and ordering of the microdomains are affected by strong wetting constraints and a reduced chain mobility on the substrate. The thinnest self-assembled layer of the copolymer films shows no in-plane microphase separation on both types of substrates. In the case of spherical PS-PB diblock copolymer films, it is observed thatthe ordering of the microdomains is improved in the films on the PMMA substrates, compared to those on the bare substrates. A successful transfer of the microdomain patterns to silicon nitride substrates by a reactive ion etching technique is also demonstrated.

    Original languageEnglish (US)
    Title of host publicationMaterials Research Society Symposium - Proceedings
    EditorsW.J. Gray, I.R. Triay
    PublisherMaterials Research Society
    Pages179-184
    Number of pages6
    Volume461
    StatePublished - 1997
    EventProceedings of the 1996 MRS Fall Meeting - Boston, MA, USA
    Duration: Dec 2 1996Dec 6 1996

    Other

    OtherProceedings of the 1996 MRS Fall Meeting
    CityBoston, MA, USA
    Period12/2/9612/6/96

    Fingerprint

    Nanolithography
    Block copolymers
    Thin films
    Substrates
    Polybutadienes
    Polystyrenes
    Polymethyl Methacrylate
    Silicon nitride
    Copolymers
    Microphase separation
    Reactive ion etching
    Spin coating
    Silicon
    Wetting

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials

    Cite this

    Park, M., Harrison, C., Chaikin, P. M., Register, R. A., Adamson, D., & Yao, N. (1997). Investigation of diblock copolymer thin film morphology for nanolithography. In W. J. Gray, & I. R. Triay (Eds.), Materials Research Society Symposium - Proceedings (Vol. 461, pp. 179-184). Materials Research Society.

    Investigation of diblock copolymer thin film morphology for nanolithography. / Park, Miri; Harrison, Christopher; Chaikin, Paul M.; Register, Richard A.; Adamson, Douglas; Yao, Nan.

    Materials Research Society Symposium - Proceedings. ed. / W.J. Gray; I.R. Triay. Vol. 461 Materials Research Society, 1997. p. 179-184.

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Park, M, Harrison, C, Chaikin, PM, Register, RA, Adamson, D & Yao, N 1997, Investigation of diblock copolymer thin film morphology for nanolithography. in WJ Gray & IR Triay (eds), Materials Research Society Symposium - Proceedings. vol. 461, Materials Research Society, pp. 179-184, Proceedings of the 1996 MRS Fall Meeting, Boston, MA, USA, 12/2/96.
    Park M, Harrison C, Chaikin PM, Register RA, Adamson D, Yao N. Investigation of diblock copolymer thin film morphology for nanolithography. In Gray WJ, Triay IR, editors, Materials Research Society Symposium - Proceedings. Vol. 461. Materials Research Society. 1997. p. 179-184
    Park, Miri ; Harrison, Christopher ; Chaikin, Paul M. ; Register, Richard A. ; Adamson, Douglas ; Yao, Nan. / Investigation of diblock copolymer thin film morphology for nanolithography. Materials Research Society Symposium - Proceedings. editor / W.J. Gray ; I.R. Triay. Vol. 461 Materials Research Society, 1997. pp. 179-184
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