Electron impact ionization of the TiClx (x = 1 - 3) free radicals

V. Tarnovsky, R. Basner, M. Schmidt, K. Becker

Research output: Contribution to journalArticle

Abstract

Titanium tetrachloride (TiCl4) is used for the plasma-assisted chemical vapor deposition of titanium nitride films. We studied the electron impact ionization of TiClx (x = 1 - 3) free radicals, which are abundant constitutents in TiCl4-containing processing plasmas, for electron energies from threshold to 100 eV. Absolute partial cross sections for the formation of all singly charged molecular ions were measured using the fast-beam technique. Dissociative ionization was found to be the dominant process for TiCl3 whereas the formation of the respective parent ions plays a more important role for TiCl2 and TiCl. Total single ionization cross sections for the three radicals could not be determined with reasonable accuracy because of problems in the determination of the cross sections for the formation of the atomic ions Ti+ and Cl+ for the three targets and, as a consequence, no comparison of the measured cross sections with calculated total single ionization cross sections is possible.

Original languageEnglish (US)
Pages (from-to)1-5
Number of pages5
JournalInternational Journal of Mass Spectrometry
Volume208
Issue number1-3
DOIs
StatePublished - Jul 18 2001

Fingerprint

Impact ionization
Free radicals
free radicals
electron impact
Free Radicals
Ionization
ionization cross sections
Ions
ionization
Electrons
cross sections
Plasma applications
tetrachlorides
Titanium nitride
titanium nitrides
molecular ions
Chemical vapor deposition
ions
titanium
Titanium

Keywords

  • Cross sections
  • Electron impact ionization
  • Plasma deposition
  • Titanium tetrachloride

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Spectroscopy

Cite this

Electron impact ionization of the TiClx (x = 1 - 3) free radicals. / Tarnovsky, V.; Basner, R.; Schmidt, M.; Becker, K.

In: International Journal of Mass Spectrometry, Vol. 208, No. 1-3, 18.07.2001, p. 1-5.

Research output: Contribution to journalArticle

Tarnovsky, V. ; Basner, R. ; Schmidt, M. ; Becker, K. / Electron impact ionization of the TiClx (x = 1 - 3) free radicals. In: International Journal of Mass Spectrometry. 2001 ; Vol. 208, No. 1-3. pp. 1-5.
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AB - Titanium tetrachloride (TiCl4) is used for the plasma-assisted chemical vapor deposition of titanium nitride films. We studied the electron impact ionization of TiClx (x = 1 - 3) free radicals, which are abundant constitutents in TiCl4-containing processing plasmas, for electron energies from threshold to 100 eV. Absolute partial cross sections for the formation of all singly charged molecular ions were measured using the fast-beam technique. Dissociative ionization was found to be the dominant process for TiCl3 whereas the formation of the respective parent ions plays a more important role for TiCl2 and TiCl. Total single ionization cross sections for the three radicals could not be determined with reasonable accuracy because of problems in the determination of the cross sections for the formation of the atomic ions Ti+ and Cl+ for the three targets and, as a consequence, no comparison of the measured cross sections with calculated total single ionization cross sections is possible.

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