Electron collisions with processing plasma constituents

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The author is studying the electron-impact dissociation of NF3, CF4, SF6, BCl3, and CCl2F2, which are among in the most commonly employed reactive constituents of etchant gas plasmas. The objective is to determine absolute cross sections and appearance potentials for the formation of the various radiating, metastable, and neutral ground-state fragments that are produced by controlled electron-impact dissociation of these molecules. Experimental techniques include electron and optical emission spectroscopy, mass spectroscopy, time-of-flight (TOF), and laser-induced-fluorescence techniques. Results on molecular emissions in the near ultraviolet region of the the optical spectrum are reported. These include the emission of the BCl A → X band system from BCl3, the CCl A → X and CCl+ A → X band systems from CCl2F2, and continuous UV emissions following dissociative electron impact on SF6 and NF3.

Original languageEnglish (US)
Title of host publicationIEEE Int Conf Plasma Sci 1989
Editors Anon
Place of PublicationPiscataway, NJ, United States
PublisherPubl by IEEE
Pages90-91
Number of pages2
StatePublished - 1989
EventIEEE International Conference on Plasma Science 1989 - Buffalo, NY, USA
Duration: May 22 1989May 24 1989

Other

OtherIEEE International Conference on Plasma Science 1989
CityBuffalo, NY, USA
Period5/22/895/24/89

Fingerprint

Plasma applications
Electrons
Optical emission spectroscopy
Ground state
Fluorescence
Spectroscopy
Plasmas
Molecules
Lasers
Gases

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Becker, K. H. (1989). Electron collisions with processing plasma constituents. In Anon (Ed.), IEEE Int Conf Plasma Sci 1989 (pp. 90-91). Piscataway, NJ, United States: Publ by IEEE.

Electron collisions with processing plasma constituents. / Becker, Kurt H.

IEEE Int Conf Plasma Sci 1989. ed. / Anon. Piscataway, NJ, United States : Publ by IEEE, 1989. p. 90-91.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Becker, KH 1989, Electron collisions with processing plasma constituents. in Anon (ed.), IEEE Int Conf Plasma Sci 1989. Publ by IEEE, Piscataway, NJ, United States, pp. 90-91, IEEE International Conference on Plasma Science 1989, Buffalo, NY, USA, 5/22/89.
Becker KH. Electron collisions with processing plasma constituents. In Anon, editor, IEEE Int Conf Plasma Sci 1989. Piscataway, NJ, United States: Publ by IEEE. 1989. p. 90-91
Becker, Kurt H. / Electron collisions with processing plasma constituents. IEEE Int Conf Plasma Sci 1989. editor / Anon. Piscataway, NJ, United States : Publ by IEEE, 1989. pp. 90-91
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AB - The author is studying the electron-impact dissociation of NF3, CF4, SF6, BCl3, and CCl2F2, which are among in the most commonly employed reactive constituents of etchant gas plasmas. The objective is to determine absolute cross sections and appearance potentials for the formation of the various radiating, metastable, and neutral ground-state fragments that are produced by controlled electron-impact dissociation of these molecules. Experimental techniques include electron and optical emission spectroscopy, mass spectroscopy, time-of-flight (TOF), and laser-induced-fluorescence techniques. Results on molecular emissions in the near ultraviolet region of the the optical spectrum are reported. These include the emission of the BCl A → X band system from BCl3, the CCl A → X and CCl+ A → X band systems from CCl2F2, and continuous UV emissions following dissociative electron impact on SF6 and NF3.

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