Effect of chamber wall conditions on Cl and Cl2 concentrations in an inductively coupled plasma reactor

Saurabh J. Ullal, Anna R. Godfrey, Erik Edelberg, Linda Braly, Vahid Vahedi, Eray S. Aydil

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Abstract

The effect of chamber wall conditions on the gas phase composition of a Cl2 plasma was studied in an inductively coupled plasma reactor. Gas phase Cl and Cl2 concentrations were determined by optical emission spectroscopy in conjunction with actinometry. Overall, the results highlight the importance of controlling the chamber wall conditions and its significant effects on the plasma composition.

Original languageEnglish (US)
Pages (from-to)43-52
Number of pages10
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume20
Issue number1
DOIs
StatePublished - Jan 1 2002

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ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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