Characterization of X-ray induced damage in alkanethiolate monolayers by high-resolution photoelectron spectroscopy

K. Heister, M. Zharnikov, M. Grunze, L. S.O. Johansson, A. Ulman

Research output: Contribution to journalArticle

Abstract

Synchrotron-based high-resolution X-ray photoelectron spectroscopy was for the first time applied to investigate the damage in self-assembled monolayers (SAMs) of alkanethiols (AT) on Au caused by soft X-rays. The observed changes in AT SAMs and, in particular, the appearance of a new, irradiation-induced sulfur species are identical to those caused by electron bombardment, implying that most of the damage is produced by the photoelectrons and secondary electrons. The irradiation-induced sulfur species is identified as a dialkyl sulfide distributed within the AT film. Only minutes of monochromatized X-ray irradiation at an undulator beamline destroys the AT adlayer completely.

Original languageEnglish (US)
Pages (from-to)8-11
Number of pages4
JournalLangmuir
Volume17
Issue number1
DOIs
StatePublished - Jan 9 2001

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ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Spectroscopy
  • Electrochemistry

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