Characterization of X-ray induced damage in alkanethiolate monolayers by high-resolution photoelectron spectroscopy

K. Heister, M. Zharnikov, M. Grunze, L. S O Johansson, Abraham Ulman

Research output: Contribution to journalArticle

Abstract

Synchrotron-based high-resolution X-ray photoelectron spectroscopy was for the first time applied to investigate the damage in self-assembled monolayers (SAMs) of alkanethiols (AT) on Au caused by soft X-rays. The observed changes in AT SAMs and, in particular, the appearance of a new, irradiation-induced sulfur species are identical to those caused by electron bombardment, implying that most of the damage is produced by the photoelectrons and secondary electrons. The irradiation-induced sulfur species is identified as a dialkyl sulfide distributed within the AT film. Only minutes of monochromatized X-ray irradiation at an undulator beamline destroys the AT adlayer completely.

Original languageEnglish (US)
Pages (from-to)8-11
Number of pages4
JournalLangmuir
Volume17
Issue number1
DOIs
StatePublished - Jan 9 2001

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Photoelectron spectroscopy
Monolayers
photoelectron spectroscopy
Irradiation
Self assembled monolayers
damage
Sulfur
X rays
irradiation
high resolution
sulfur
Wigglers
x rays
electron bombardment
Electrons
Sulfides
Photoelectrons
Synchrotrons
sulfides
synchrotrons

ASJC Scopus subject areas

  • Colloid and Surface Chemistry
  • Physical and Theoretical Chemistry

Cite this

Characterization of X-ray induced damage in alkanethiolate monolayers by high-resolution photoelectron spectroscopy. / Heister, K.; Zharnikov, M.; Grunze, M.; Johansson, L. S O; Ulman, Abraham.

In: Langmuir, Vol. 17, No. 1, 09.01.2001, p. 8-11.

Research output: Contribution to journalArticle

Heister, K. ; Zharnikov, M. ; Grunze, M. ; Johansson, L. S O ; Ulman, Abraham. / Characterization of X-ray induced damage in alkanethiolate monolayers by high-resolution photoelectron spectroscopy. In: Langmuir. 2001 ; Vol. 17, No. 1. pp. 8-11.
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