Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films

Mayur S. Valipa, Tamas Bakos, Eray Aydil, Dimitrios Maroudas

Research output: Contribution to conferencePaper

Original languageEnglish (US)
Number of pages1
StatePublished - Dec 1 2005
Event05AIChE: 2005 AIChE Annual Meeting and Fall Showcase - Cincinnati, OH, United States
Duration: Oct 30 2005Nov 4 2005

Other

Other05AIChE: 2005 AIChE Annual Meeting and Fall Showcase
CountryUnited States
CityCincinnati, OH
Period10/30/0511/4/05

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Surface diffusion
Amorphous silicon
Plasmas
Thin films
Hydrogen

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Valipa, M. S., Bakos, T., Aydil, E., & Maroudas, D. (2005). Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films. Paper presented at 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Cincinnati, OH, United States.

Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films. / Valipa, Mayur S.; Bakos, Tamas; Aydil, Eray; Maroudas, Dimitrios.

2005. Paper presented at 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Cincinnati, OH, United States.

Research output: Contribution to conferencePaper

Valipa, MS, Bakos, T, Aydil, E & Maroudas, D 2005, 'Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films' Paper presented at 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Cincinnati, OH, United States, 10/30/05 - 11/4/05, .
Valipa MS, Bakos T, Aydil E, Maroudas D. Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films. 2005. Paper presented at 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Cincinnati, OH, United States.
Valipa, Mayur S. ; Bakos, Tamas ; Aydil, Eray ; Maroudas, Dimitrios. / Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films. Paper presented at 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Cincinnati, OH, United States.1 p.
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