Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films

Mayur S. Valipa, Tamas Bakos, Eray Aydil, Dimitrios Maroudas

Research output: Contribution to conferencePaper

Original languageEnglish (US)
Number of pages1
Publication statusPublished - Dec 1 2005
Event05AIChE: 2005 AIChE Annual Meeting and Fall Showcase - Cincinnati, OH, United States
Duration: Oct 30 2005Nov 4 2005

Other

Other05AIChE: 2005 AIChE Annual Meeting and Fall Showcase
CountryUnited States
CityCincinnati, OH
Period10/30/0511/4/05

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ASJC Scopus subject areas

  • Engineering(all)

Cite this

Valipa, M. S., Bakos, T., Aydil, E., & Maroudas, D. (2005). Atomic-scale analysis of radical precursor and hydrogen surface diffusion on plasma-deposited amorphous silicon thin films. Paper presented at 05AIChE: 2005 AIChE Annual Meeting and Fall Showcase, Cincinnati, OH, United States.