Abstraction of hydrogen by SiH radicals from hydrogenated amorphous silicon surfaces

S. Sriraman, S. Ramalingam, Eray Aydil, D. Maroudas

Research output: Contribution to journalArticle

Abstract

The dynamics and energetics are presented of two Eley-Rideal reactions by which SiH radicals impinging at thermal energies on growth surfaces during plasma deposition of hydrogenated amorphous silicon (a-Si:H) films abstract hydrogen atoms from the surface and return to the gas phase as SiH2 radicals. The reactions were observed during classical molecular-dynamics simulations of a-Si:H film deposition from SiH radicals impinging on an initially H-terminated Si(001)-(2 × 1) surface maintained at 500 K. The H-abstraction reaction may either produce a danging bond on the surface or eliminate a surface coordination defect. The computed activation energy barriers for the two hydrogen abstraction reactions are 0.15 and 0.07 eV, respectively, and the corresponding exothermic reaction energies are 0.20 and 0.30 eV. The effects of both reactions on the growth surface are examined through detailed analysis involving the local structural configurations and the associated bond angle and bond length distributions in the vicinity of the surface hydrogen abstraction sites.

Original languageEnglish (US)
JournalSurface Science
Volume459
Issue number3
DOIs
StatePublished - Jul 10 2000

Fingerprint

Amorphous silicon
amorphous silicon
Hydrogen
hydrogen
Plasma deposition
Exothermic reactions
exothermic reactions
Energy barriers
Bond length
Thermal energy
thermal energy
Molecular dynamics
hydrogen atoms
Activation energy
Gases
vapor phases
molecular dynamics
activation energy
Atoms
Defects

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Abstraction of hydrogen by SiH radicals from hydrogenated amorphous silicon surfaces. / Sriraman, S.; Ramalingam, S.; Aydil, Eray; Maroudas, D.

In: Surface Science, Vol. 459, No. 3, 10.07.2000.

Research output: Contribution to journalArticle

Sriraman, S. ; Ramalingam, S. ; Aydil, Eray ; Maroudas, D. / Abstraction of hydrogen by SiH radicals from hydrogenated amorphous silicon surfaces. In: Surface Science. 2000 ; Vol. 459, No. 3.
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