Absolute total and partial cross sections for the electron impact ionization of tetrafluorosilane (SiF4)

R. Basner, M. Schmidt, E. Denisov, K. Becker, H. Deutsch

Research output: Contribution to journalArticle

Abstract

The absolute partial and total electron impact ionization cross sections of SiF4, including all singly charged positive ions and the doubly charged ions were analyzed. The total ionization cross section was obtained as the sum of the partial cross sections. Total single ionization cross section was compared with results of the semiclassical and semiempirical calculations and reasonable agreement was found.

Original languageEnglish (US)
Pages (from-to)1170-1177
Number of pages8
JournalJournal of Chemical Physics
Volume114
Issue number3
DOIs
StatePublished - Jan 2001

Fingerprint

Impact ionization
ionization cross sections
electron impact
Ionization
ionization
Electrons
cross sections
Positive ions
Ions
positive ions
silicon tetrafluoride
ions

ASJC Scopus subject areas

  • Atomic and Molecular Physics, and Optics

Cite this

Absolute total and partial cross sections for the electron impact ionization of tetrafluorosilane (SiF4). / Basner, R.; Schmidt, M.; Denisov, E.; Becker, K.; Deutsch, H.

In: Journal of Chemical Physics, Vol. 114, No. 3, 01.2001, p. 1170-1177.

Research output: Contribution to journalArticle

Basner, R. ; Schmidt, M. ; Denisov, E. ; Becker, K. ; Deutsch, H. / Absolute total and partial cross sections for the electron impact ionization of tetrafluorosilane (SiF4). In: Journal of Chemical Physics. 2001 ; Vol. 114, No. 3. pp. 1170-1177.
@article{a5afeb10b9d14e10b3411496d6f5ef53,
title = "Absolute total and partial cross sections for the electron impact ionization of tetrafluorosilane (SiF4)",
abstract = "The absolute partial and total electron impact ionization cross sections of SiF4, including all singly charged positive ions and the doubly charged ions were analyzed. The total ionization cross section was obtained as the sum of the partial cross sections. Total single ionization cross section was compared with results of the semiclassical and semiempirical calculations and reasonable agreement was found.",
author = "R. Basner and M. Schmidt and E. Denisov and K. Becker and H. Deutsch",
year = "2001",
month = "1",
doi = "10.1063/1.1333018",
language = "English (US)",
volume = "114",
pages = "1170--1177",
journal = "Journal of Chemical Physics",
issn = "0021-9606",
publisher = "American Institute of Physics Publising LLC",
number = "3",

}

TY - JOUR

T1 - Absolute total and partial cross sections for the electron impact ionization of tetrafluorosilane (SiF4)

AU - Basner, R.

AU - Schmidt, M.

AU - Denisov, E.

AU - Becker, K.

AU - Deutsch, H.

PY - 2001/1

Y1 - 2001/1

N2 - The absolute partial and total electron impact ionization cross sections of SiF4, including all singly charged positive ions and the doubly charged ions were analyzed. The total ionization cross section was obtained as the sum of the partial cross sections. Total single ionization cross section was compared with results of the semiclassical and semiempirical calculations and reasonable agreement was found.

AB - The absolute partial and total electron impact ionization cross sections of SiF4, including all singly charged positive ions and the doubly charged ions were analyzed. The total ionization cross section was obtained as the sum of the partial cross sections. Total single ionization cross section was compared with results of the semiclassical and semiempirical calculations and reasonable agreement was found.

UR - http://www.scopus.com/inward/record.url?scp=0035124653&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035124653&partnerID=8YFLogxK

U2 - 10.1063/1.1333018

DO - 10.1063/1.1333018

M3 - Article

VL - 114

SP - 1170

EP - 1177

JO - Journal of Chemical Physics

JF - Journal of Chemical Physics

SN - 0021-9606

IS - 3

ER -