A temperature-stabilized LiF line filter for the argon 106.7 nm resonance line

H. Knop, M. Uhrig, M. Berkemeier, K. Becker, G. F. Hanne

Research output: Contribution to journalArticle

Abstract

We present a temperature-stabilized LiF filter of 1 mm thickness which was used to isolate the Ar resonance line at 106.7 nm from adjacent Ar and Ar+ emissions in the vacuum ultraviolet in electron-impact-induced photoemission experiments. Details of the construction of the filter and of its performance characteristics as a function of temperature are discussed.

Original languageEnglish (US)
Pages (from-to)1275-1278
Number of pages4
JournalMeasurement Science and Technology
Volume8
Issue number11
DOIs
StatePublished - Nov 1997

Fingerprint

Argon
resonance lines
argon
Filter
filters
Line
Photoemission
Ultraviolet
electron impact
Vacuum
photoelectric emission
Adjacent
Electron
Temperature
vacuum
temperature
Electrons
Experiment
Experiments
Mm

ASJC Scopus subject areas

  • Polymers and Plastics
  • Ceramics and Composites
  • Materials Science (miscellaneous)

Cite this

A temperature-stabilized LiF line filter for the argon 106.7 nm resonance line. / Knop, H.; Uhrig, M.; Berkemeier, M.; Becker, K.; Hanne, G. F.

In: Measurement Science and Technology, Vol. 8, No. 11, 11.1997, p. 1275-1278.

Research output: Contribution to journalArticle

Knop, H. ; Uhrig, M. ; Berkemeier, M. ; Becker, K. ; Hanne, G. F. / A temperature-stabilized LiF line filter for the argon 106.7 nm resonance line. In: Measurement Science and Technology. 1997 ; Vol. 8, No. 11. pp. 1275-1278.
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